Plansee Se

Plansee Japan Ltd.

Plansee Shanghai High Performance Material Ltd.

Jiandong Lu

Chao Chen

Tsutomu Kuniya

Christian Linke

Hennrik Schmidt

A sputtering target includes a tubular backing tube which has an axis which is defined as an axial direction, and a plane in which a radial direction lies is perpendicular to the axial direction. A cylindrical target segment is arranged on the tubular backing tube extends along the axial direction through at least 90% of length of the cylindrical target segment. A bonding material is arranged between the tubular backing tube and the target segment. The sputtering target includes a stop member for a target segment adjacent to the stop member, the stop member is monolithically formed with and radially protruding along the tubular backing tube at an axial end region of the tubular backing tube and extending along a part of a circumference of the tubular backing tube. A circumferential sealing member is inserted between the stop member and the target segment to prevent leakage of the bonding material.

Growing community of inventors

Shanghai, China

Jiandong Lu