Industrial Technology Research Institute

Jia-Jen Chang

Ming-Sheng Leu

Tai-Sheng Chen

Jin-Bao Wu

Ding-Shiang Wang

Chin-Te Shih

Li-Duan Tsai

Wu-Han Liu

Chun-Lung Li

Jenn-Yeu Hwang

A manufacturing method of the ESD protection device includes the following steps. A surface treatment is performed on the substrate. A link layer is formed on the substrate after the surface treatment, wherein a material of the link layer includes a metal material. A progressive layer is formed on the link layer, wherein a material of the progressive layer includes a non-stoichiometric metal oxide material, and an oxygen concentration in the non-stoichiometric metal oxide material is increased gradually away from the substrate in a thickness direction of the progressive layer. A composite layer is formed on the progressive layer, wherein the composite layer includes a stoichiometric metal oxide material and a non-stoichiometric metal oxide material, and a ratio of the non-stoichiometric metal oxide material and the stoichiometric metal oxide material in the composite layer may make a sheet resistance value of the composite layer 1&#xd7;10to 1&#xd7;10&#x3a9;/sq.

Manufacturing method of ESD protection device

An ESD protection composite structure includes a link layer, a progressive layer, and a composite layer. The link layer is used for disposing the ESD protection composite structure on a substrate, wherein a material of the link layer includes a metal material. The progressive layer is disposed on the link layer, wherein the material of the progressive layer includes a non-stoichiometric metal oxide material, and an oxygen concentration in the non-stoichiometric metal oxide material is increased gradually away from the substrate in a thickness direction of the progressive layer. The composite layer is disposed on the progressive layer, wherein the composite layer includes a stoichiometric metal oxide material and a non-stoichiometric metal oxide material, and a ratio of the non-stoichiometric metal oxide material and the stoichiometric metal oxide material in the composite layer may make a sheet resistance value of the composite layer 1&#xd7;10&#x3a9;/sq to 1&#xd7;10&#x3a9;/sq.

ESD protection composite structure, ESD protection device, and manufacturing method thereof

A hydrophobic alloy film and a manufacturing method thereof are provided. The hydrophobic alloy film includes Al, Cu, O, and at least one selected from the group consisting of Fe, Co, Ni, and Cr, or Ti, Zr, O, and at least one selected from the group consisting of Fe, Co, Ni, and Cr. The content of each of Al and Ti is in the range of 40 at. % to 70 at. %. The content of each of Cu and Zr is in the range of 10 at. % to 40 at. %. The total content of at least one selected from the group consisting of Fe, Co, Ni, and Cr is in the range of 10 at. % to 30 at. %. The content of O is in the range of 10 at. % to 30 at. %. The hydrophobic alloy film has a quasicrystal structure and nanoparticles.

Hydrophobic alloy film and manufacturing method thereof

A protected active metal electrode and a device with the electrode are provided. The protected active metal electrode includes an active metal substrate and a protection layer on a surface of the active metal substrate. The protection layer at least includes a metal thin film covering the surface of the active metal substrate and an electrically-conductive thin film covering a surface of the metal thin film. A material of the metal thin film is Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, or W. A material of the electrically-conductive thin film is selected from nitride of a metal in the metal thin film, carbide of a metal in the metal thin film, a diamond-like carbon (DLC), and a combination thereof.

Protected active metal electrode and device with the electrode

A structural material of diamond like carbon (DLC) composite layers is provided. The structural material includes a composite material which is consisted of a metal layer, a first metal nitride layer, and a DLC thin film. The metal layer includes aluminum (Al), copper (Cu), zirconium (Zr), nickel (Ni), or vanadium (V). The first metal nitride layer includes aluminum nitride (Al&#x2014;N), zirconium nitride (Zr&#x2014;N), vanadium nitride (V&#x2014;N), or nickel nitride (Ni&#x2014;N). The DLC thin film of the structural material of DLC composite layers has high quality tetragonally bonded amorphous carbon (ta-C) with a sp(C&#x2014;C) bonding ratio of more than 30%. Therefore, it is suitable for the work pieces in the mechanical, chemical, electricity, photoelectric, and heat transfer fields.

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Yunlin County, Taiwan

Jia-Jen Chang