Samsung Electronics Co., Ltd.

Ji-myung Kim

Kwang-sub Yoon

Tae-hwa Jeong

Young-sik Park

Yong-chul Kim

Gyu-min Jeong

A substrate can include a feature pattern included in an integrated circuit on the substrate and an in-situ metrology pattern spaced apart from the feature pattern on the substrate, the in-situ metrology pattern and the feature pattern both configured to have equal heights relative to a surface of the substrate.

Substrate target for in-situ lithography metrology, metrology method for in-situ lithography, and method of manufacturing integrated circuit device by using in-situ metrology

A photomask includes a focus metrology mark region that includes a plurality of focus monitor patterns. To measure a focal variation of a feature pattern formed on a substrate, a substrate target for lithography metrology including a focus metrology mark formed on the same level as the feature pattern is used. A lithography metrology apparatus includes a projection device including a polarizer; a detection device detecting the powers of &#xb1;n-order diffracted light beams from among output beams diffracted by the focus metrology mark of a to-be-measured substrate; and a determination device which determines, from a power deviation between the &#xb1;n-order diffracted light beams, defocus experienced by the feature pattern.

Photomask including focus metrology mark, substrate target including focus monitor pattern, metrology method for lithography process, and method of manufacturing integrated circuit device

Growing community of inventors

Hwaseong-si, South Korea

Ji-myung Kim