Lg Chem, Ltd

Samsung Electronics Co., Ltd.

Korea Research Institute of Chemical Technology

Hyundai Mobis Co., Ltd.

Seoul Viosys Co., Ltd.

Hyundai Motor Company

Semes Co., Ltd.

Hanon Systems

Center for Integrated Smart Sensors Foundation

Kia Corporation

Yonsei University

Sungkyunkwan University

Sk on Co., Ltd.

Postech Academy-industry Foundation

Iucf-hyu

Ji Hoon Park

Tae Sun Chang

Byoung Kun Jeon

Iljeong Heo

Chae Hon Kim

Kang Min Kim

Yong Hyun Baek

Ji Hun Kang

Deok Kwan Choi

Won Gon Kim

Min Heo

Tae Ho Bang

Hyun Woo Shim

Du Ho Kim

Soo Min Jeon

A Ra Lee

Moon Soo Park

Young Shin Lee

Bong Jae Rhee

Seong Min Lee

Hyun Woo Kim

Young Woo You

Soo Min Kim

Ji Hun Heo

Jin Hee Lee

So Ra Lee

Beom Sik Kim

Se Young Jang

Joo Han Kim

Jin Man Kim

Seung Ho Lee

Young Chul Kim

Seok Cheon Baek

Hak Kyu Kim

Young Jin Kim

Seung Hun Chae

Kil Sang Jang

Wan Jae Park

Jeong Kwon Suh

Hye Min Yu

Kyung Seok Cho

Chung Ki Min

Yun Ho Jeong

Bok Sun Kang

Hyun Seok Jung

Sang Joon Kim

Jeong Hyun Son

Byung Kwan You

Boh Chang Kim

Bu Gon Shin

Dae Hee Lee

Pyung Soon Kim

Jae Woo Lee

Yeon Keun Lee

Jin Woo Choung

Sin Young Kim

Dong-Hun Kim

Byung Sun Lee

Su Young Ryu

Jung Woon Kim

Hyun Jae Kim

Jin Yong Park

Chong Min Kyung

Mun Kyu Joo

Jun Won Chang

Song Hee Jung

Byoung Il Lee

Chung Keun Yoo

Jihun Heo

Hyo Shik Choi

Bongjun Kim

Deok Hwan Kim

Joong Shik Shin

Jin Young Yang

Jihui Seo

Dong Ryul Lee

Seong Gil Lee

Kemsuk Seo

Da Mi Lee

Yoon Jong Ju

Myeong Hwan Ma

Bai Sun Kong

Ji Hoon Lim

Ju Yong Park

Young Je Um

Jin Hyuk Choi

Jun Ho Cha

Yongwoo Kim

Sung-Soo Moon

Jaeyong Lee

Jong Byung Lee

Taeyoon An

Gilnam Hong

Jeong Jae Lee

Byoung Soo Lee

Du Ri Kim

Hyun Chang Shin

Young-Woong Suh

Jinho Oh

Young Sik Kim

An object of the present invention is to increase the reduction performance of nitrogen oxides compared to existing three-way catalysts; simultaneously inhibit the emission of ammonia and nitrous oxide; simplify a process by means of a method of further doping an iridium-ruthenium catalyst into a commercial three-way catalyst; and expand the scope of application. The present invention provides a catalyst for simultaneously inhibiting the emission of ammonia and nitrous oxide by doping an iridium-ruthenium catalyst component into a three-way catalyst (TWC), a diesel oxidation catalyst, or a lean NOx trap supported on a honeycomb support.

Catalyst for simultaneously inhibiting emission of ammonia and nitrous oxide

Provided is an electro-magnetic compatibility (EMC) filter including a lower bobbin having a U-shaped cross-sectional shape, a lower core including a magnetic material having a U-shaped cross-sectional shape and disposed on the lower bobbin, a bus bar disposed on the lower core, an upper bobbin having a hollow inside, having a hexahedral shape with one side open, and configured to cover an upper portion of the lower bobbin, and an upper core including a magnetic material having a plate-like shape, disposed in an internal space of the upper bobbin, and disposed on the lower core (U core) to cover the bus bar with a gap maintained by the bus bar between the upper and lower cores when the lower bobbin and the upper bobbin are coupled to each other.

EMC filter for electromagnetic regulation of converter and manufacturing method thereof

The present specification relates to an optical film, and a display device including an optical film, comprising a dye or pigment absorbing at least some of a wavelength of 490 nm to 510 nm; having a transmission color of a D65 light source, a CIE standard illuminant, of −8<a*<8 and −8<b*<8, wherein a* indicates a direction the transmission color is leaned between red and green and b* indicates a direction the transmission color is leaned between yellow and blue; and satisfying the following Equations 1 and 2:%(500 nm)<%(530 nm),  [Equation 1][%(500 nm)×1.8]<[%(460 nm)+%(610 nm)]  [Equation 2] wherein, in Equations 1 and 2, T % (A nm) is transmittance at a wavelength of A nm.

Optical film and display device comprising same

Proposed is a carbon dioxide reforming (CDR) reactor having a multilayered catalyst layer arrangement for preventing catalyst deactivation, wherein, in the reactor in which a CDR reaction for reacting methane (CH) with carbon dioxide (CO) to reform the methane into a synthesis gas including carbon monoxide (CO) and hydrogen (H) is performed, in order to prevent a case where an endothermic reaction between a catalyst and heated reactant gas supplied to the reactor gradually causes the temperature of the reactant gas to decrease and the catalyst is deactivated by cokes generated due to the decrease in temperature of the reactant gas, CDR catalysts in the reactor are arranged in multiple layers in a multilayered structure to allow the reactant gas temperature that has decreased due to the endothermic reaction to be restored in spaces between the catalyst layers.

CDR reactor having multilayered catalyst layer arrangement for preventing catalyst deactivation

A medium for direct differentiation of embryonic stem cell-derived mesenchymal stem cells, a method of preparing mesenchymal stem cells by using the same, mesenchymal stem cells prepared thereby, and a cell therapy product comprising the same mesenchymal stem cells. In a medium composition and in a method according to an embodiments, mesenchymal stem cells may be prepared at high yield within a short period of time. In addition, the method is simple in preparation procedure because of the absence of an embryoid body formation step that allows homogeneous cells to be prepared, thus advantageously providing a cell therapy product within a reduced period of time, compared to conventional methods.

Medium for direct differentiation of pluripotent stem cell-derived mesenchymal stem cell, method for preparing mesenchymal stem cell by using same, and mesenchymal stem cell prepared thereby

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having an inner space; a plasma source configured to apply an electric field; a first gas supply unit configured to supply a first process gas to a region to which the plasma source applies the electric field, the first process gas excited to a plasma when the first process gas is applied with an electric field of a first intensity at a first pressure atmosphere; a support unit disposed in the inner space and configured to support a substrate to be treated; and an electrodeless lamp disposed above the substrate in the inner space, and wherein the electrodeless lamp includes an electric field transmissive housing having a discharging space therein; and a discharging material including a luminous material and filling the discharging space, the discharging space of the housing being pressurized to a second pressure, and the discharging material discharging and luminating when applied with an electric field of a second intensity higher than the first intensity at a second pressure.

Apparatus for treating substrate and method for treating substrate

There are provided a die surface treatment apparatus capable of sequentially performing reduction and activation processes on dies in a dual zone and a die bonding system including the die surface treatment apparatus. The die surface treatment apparatus includes: a stage supporting dies, a first plasma generator installed on a moving path of the dies, the first plasma generator performing a reduction process on surfaces of the dies, in a first plasma area; and a second plasma generator installed on the moving path of the dies, the second plasma generator performing a hydrophilization process on the surfaces of the dies, in a second plasma area.

Die surface treatment apparatus and die bonding system including the same

The present invention provides a substrate treating method, including: a first treatment operation of treating the substrate by using first plasma generated by exciting first gas; and a second treatment operation of treating the substrate by using second plasma generated by exciting second gas different from the first gas.

Substrate treating apparatus and substrate treating method

A lighting apparatus includes a light emitting diode, in which the light emitting diode includes an n-type nitride semiconductor layer, an active layer located on the n-type nitride semiconductor layer, and a p-type nitride semiconductor layer located on the active layer. The light emitting diode emits light that varies from yellow light to white light depending on a driving current.

Single chip multi band LED and application thereof

An electronic device according to one embodiment may include: a transparency layer; a pixel layer disposed under the transparency layer, and including pixels that emit light in a visible ray and for displaying a content through the transparency layer; a display panel disposed under the pixel layer, and including a substrate layer including switches operating the pixels; a bio-sensor disposed under the display panel, and enabling acquisition of biometric information by using reflected light obtained through reflection, by an external object, of light output through the pixels; and a coating reflecting external light in an infrared ray band transmitted to the substrate layer, and allowing transmission of the light in a visible ray band, wherein the coating is formed between the transparency layer and the display panel.

Electronic device comprising display

A method for manufacturing a lower case of a battery module includes an extrusion molding operation in which a metal material is extruded to mold a cooling plate member and a sidewall member of a battery module; a forging operation in which an internal surface of the cooling plate member is pressed with a punch, having an edge of a lower end provided vertically to form an accommodation groove; and a forming operation in which an embossed piece, protruding to an external surface of the cooling plate member by forming the accommodation groove, is removed.

Method for manufacturing case of battery module and case of battery module

A light emitting diode includes an n-type nitride semiconductor layer, a V-pit generation layer located over the n-type nitride semiconductor layer and having a V-pit, an active layer located on the V-pit generation layer, and a p-type nitride semiconductor layer located on the active layer. The active layer includes a well layer, which includes a first well layer portion formed along a flat surface of the V-pit generation layer and a second well layer portion formed in the V-pit of the V-pit generation layer. The active layer emits light having at least two peak wavelengths at a single chip level.

Single chip multi band LED

A light emitting diode includes an n-type nitride semiconductor layer, an active layer located on the n-type nitride semiconductor layer, and a p-type nitride semiconductor layer located on the active layer. The active layer has a single structure of a multi-quantum well in which a plurality of barrier layers and a plurality of well layers are stacked, and the active layer emits white light.

The present invention relates to a VOC reduction system and a VOC reduction method that applies pulse type thermal energy to a catalyst to activate the catalyst and oxidizes and removes the VOC.

System for reducing voc and nitrogen oxide and method for reducing same

An aspect of the present disclosure provides a bus bar as a winding in a core of a transformer includes multiple sub-bars arranged horizontally and connected in parallel so as to minimize an AC current in the transformer, and the sub-bars have different widths and thus resistances or impedances with respect to a current flowing through the sub-bars are the same. Another aspect of the present disclosure provides a method of designing a bus bar for resistance or impedance matching between multiple sub-bars included in the bus bar to share a current to minimize an AC current in the transformer. Another aspect of the present disclosure provides a transformer, for a DC-DC converter for use in a vehicle, which is manufactured by the method of designing a bus bar.

Bus bar for minimizing AC loss in transformer and method of designing the same

Growing community of inventors

Gyeonggi-do, South Korea

Ji Hoon Park