Samsung Display Co., Ltd.

Ji-Hee Son

Youngmin Moon

Seungyong Song

Sungsoon Im

Minho Moon

DuckJung Lee

Seul Bee Lee

Hye Yong Chu

Jiyoung Choung

Sungchul Kim

Seul Gee Lee

Jeongkuk Kim

Jinoh Kwag

Junho Jo

Duck Jung Lee

Areum Lee

Sung Soon Im

A deposition apparatus includes a chamber, a deposition source disposed in the chamber, a mask assembly, and a base substrate disposed on the mask assembly. The mask assembly includes a frame including frame openings, a mask disposed on the frame and including deposition holes, and a welding stick disposed on the mask. A welding groove is disposed along an edge of the frame and has a depth in the thickness direction of the frame. The welding stick overlaps the welding groove.

Method for manufacturing mask and deposition apparatus including mask

An embodiment provides a deposition apparatus including a mask frame, an opening sheet, a deposition mask, and an electrostatic chuck. In the mask frame, a first opening part is defined. The opening sheet is disposed on the mask frame. In the opening sheet, a second opening part overlapping the first opening part is defined. The deposition mask is disposed on the opening sheet. In the deposition mask, a plurality of third opening parts overlapping the second opening part are defined. The electrostatic chuck is disposed on the deposition mask and on which a substrate is disposed. The substrate is disposed on a surface of the electrostatic chuck, and AC power is applied to the deposition mask.

Deposition apparatus and method for seating mask of deposition apparatus

A mask, a mask assembly, and a method of fabricating a mask are disclosed herein. The mask comprises a polymer film in which at least one cell region and at least one peripheral region are defined, the at least one peripheral region surrounding the at least one cell region, a conductive layer disposed on the polymer film and including a metal, an inorganic layer disposed between the polymer film and the conductive layer and including a silicon-based inorganic material, and holes that penetrate the polymer film, the conductive layer, and the inorganic layer and overlap the at least one cell region in a plan view.

Mask, mask fabrication method, and mask assembly

A deposition mask including a resin film including first holes, a non-resin layer disposed on the resin film and including second holes corresponding to the first holes, and a protective layer disposed on the non-resin layer and including third holes corresponding to the first holes, wherein the protective layer includes a first portion disposed on a top surface of the non-resin layer, and a second portion covering a side surface of the second holes of the non-resin layer.

Mask for deposition

A deposition apparatus includes a chamber, a mask assembly disposed in the chamber and including an open sheet including a first area in which a first deposition hole is defined and a second area in which a second deposition hole spaced apart from the first deposition hole is defined, a first mask including multiple deposition openings that overlap the first area, and a second mask including multiple deposition openings that overlap the second area, a deposition substrate disposed on the mask assembly, and a deposition source spraying a deposition material to the mask assembly.

Deposition apparatus having mask assembly and method of repairing the mask assembly

A mask includes a protruding portion provided with a deposition hole formed therethrough and including an upper surface, a lower surface facing the upper surface, and a side surface disposed between the upper surface and the lower surface and inclined at an angle with respect to the lower surface, a peripheral portion including a first surface extending from the upper surface, a second surface facing the first surface and having a step difference with respect to the lower surface of the protruding portion, and a coating layer disposed on the protruding portion. The protruding portion includes at least one of a protrusion protruded from the side surface of the protruding portion and a groove formed by removing at least a portion of the protruding portion from the side surface of the protruding portion, and the coating layer covers at least one of the protrusion and the groove.

Mask and deposition apparatus including the same

Provided is a mask including a mask frame including a base part in which cell openings are defined, and a coating part surrounding edges of the cell openings, covering at least a portion of an upper surface of the base part, and including a materials that is different from that of the base part, and unit masks on the mask frame, respectively corresponding to the cell openings, including a material that is different from that of the coating part, and in which openings are defined.

Mask and method of manufacturing the same

A method of providing a mask includes providing a first mask layer facing a second mask layer, in the second mask layer, providing a first opening which corresponds to a deposition opening of the mask, providing an auxiliary layer which faces the first mask layer with the second mask layer therebetween and covers the first opening, in the auxiliary layer, providing a second opening which corresponds to the first opening and exposes the first mask layer to outside the auxiliary layer, in the first mask layer, providing a third opening which corresponds to the first opening and the second opening by using the auxiliary layer as a mask and providing the auxiliary layer separated from the first mask layer and the second mask layer to provide the deposition mask having the first mask layer having the third opening and the second mask layer having the first opening.

Mask, method of providing mask, and method of providing display panel using the same

A deposition mask includes a mask film including a polymer, a plurality of first deposition openings defined in the mask film. and a conductive layer which is on the mask film and receives a power. The conductive layer includes a first conductive pattern and a second conductive pattern spaced apart from each other along the mask film and electrically disconnected from each other. The conductive layer receives the power at the first conductive pattern and the second conductive pattern, and receipt of the power at the first conductive pattern and the second conductive pattern provides an electrostatic chuck function of the deposition mask.

Provided is a mask having a plurality of cell areas, each of which has a plurality of through-portions defined therein. The mask includes a mask film including a polymer and a conductive layer disposed on at least one surface of the mask film and including conductive metal or a conductive metal oxide. Accordingly, precision of a deposition process is enhanced while reducing process time and costs in a manufacturing process of the mask, and thus the yield in manufacturing a display panel using the mask is improved. Therefore, the display panel manufactured using the mask may have improved reliability.

Mask, method for manufacturing the same, and method for manufacturing display panel

Provided is a mask which includes a mask body having a plurality of through hole portions and including a polymer film and a plurality of magnetic particles dispersed in the polymer film, and a polymer coating layer disposed on an outer surface of the mask body. Accordingly, the time and cost of manufacturing a mask are reduced and the precision of a deposition process is improved as well, so that the manufacturing yield of a display panel using the mask is improved and a display panel manufactured using the same has improved reliability.

Mask, method of manufacturing the same, and method of manufacturing display panel

A method of manufacturing a display apparatus includes: forming a first lower lift-off layer, a first upper lift-off layer, and a first photoresist layer on a substrate on which a first pixel electrode is formed; forming a first masking layer including a first photoresist pattern, a first upper lift-off pattern, and a first lower lift-off pattern, which expose the first pixel electrode, by partially removing the first photoresist layer, the first upper lift-off layer, and the first lower lift-off layer; forming a first light emitting layer and a first counter electrode on the first pixel electrode by using the first masking layer; forming a first passivation layer on the first counter electrode; and removing the first masking layer.

Growing community of inventors

Hwaseong-si, South Korea

Ji-Hee Son