Samsung Electronics Co., Ltd.

Sungkyunkwan University

Fine Semitech Co., Ltd.

Ji-Beom Yoo

Seul-Gi Kim

Dong-Wook Shin

Tae-Sung Kim

Soo-Young Kim

Mun Ja Kim

Mun-Ja Kim

Taesung Kim

Byung-Gook Kim

Hee-Bom Kim

Sooyoung Kim

Hwan-Chul Jeon

Jang-dong You

Sang-jin Cho

Myung-shik Chang

Jae-Hyuck Choi

Munja Kim

Hwanchul Jeon

Hwan Chul Jeon

A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.

Apparatus for manufacturing pellicle

Method of manufacturing pellicle and apparatus for assembling pellicle

A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.

Pellicle film including graphite-containing thin film for extreme ultraviolet lithography

A method of manufacturing a pellicle assembly, the method including attaching a carbon-containing thin film onto a transfer membrane in a wet atmosphere; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame.

Method of manufacturing pellicle assembly and method of photomask assembly including the same

The method includes forming a graphite layer on a substrate, forming a supporting layer on the graphite layer to form a stack of the graphite layer and the supporting layer, removing the substrate to separate the stack from the substrate, transferring the stack of the graphite layer and the supporting layer onto a frame, and removing the supporting layer from the frame.

Methods of fabricating pellicles using supporting layer

A method of manufacturing a pellicle includes forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst, forming a protective pattern on a second surface of the substrate, immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame, and replacing the etchant solution with a solvent.

Pellicles and methods of manufacturing the same

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Seoul, South Korea

Ji-Beom Yoo