Taiwan Semiconductor Manufacturing Comp. Ltd.

Jhih-Ming Lin

Chen-Hua Douglas Yu

Shang-Yun Hou

Chi-Hsi Wu

Hsien-Pin Hu

Wen-Hsin Wei

Shih-Wen Huang

Chun Hua Chang

Tsung-Yang Hsieh

Chih-Ching Lin

Chun-Che Chen

Wen-Jung Chuang

Tzu-Chung Tsai

Chien-Ying Wu

Yueh Ying Lee

A method of fabricating a photonic device includes: forming a photonic device structure that includes a SOI substrate, which includes a bulk substrate layer, a buried oxide layer on the bulk substrate layer and an active semiconductor layer on the buried oxide layer; forming an electrically conducting layer in electrical contact of the buried oxide layer, and forming a BEOL structure on a surface of the active silicon layer.

Photonic device on a semiconductor-on-insulator substrate and method of manufacturing thereof

An interposer substrate is manufactured with a scribe line between adjacent regions. In an embodiment a separate exposure reticle is utilized to pattern the scribe line. The exposure reticle to pattern the scribe line will create an exposure region which overlaps and overhangs the exposure regions utilized to form adjacent regions.

Semiconductor device and method of manufacture

Growing community of inventors

Hsinchu, Taiwan

Jhih-Ming Lin