Carl-Zeiss-Smt Ag

Carl Zeiss Semiconductor Manufacturing Technologies Ag

Eads Astrium Gmbh

Jess Koehler

Johannes Wangler

Wolfgang Singer

Damian Fiolka

Manfred Maul

Paul Van Der Veen

Markus Brotsack

Jan Hoegee

Marnix Aldert Tas

Wolfgang Holota

Sijbe Abraham Van Der Lei

An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (). The illumination system has a light distribution device () which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface () of the illumination system. The light distribution device has at least one optical modulation device () having a two-dimensional array of individual elements () that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

Illumination system for a microlithography projection exposure installation

A system is described for the optical detection of a distant object, having a light beam generating device for generating a parallel light beam, a scanning unit for generating a scan pattern by deflecting the parallel light beam over a defined angular range, and a detector unit for detecting light reflected by the distant object. The scanning unit includes a rotating polygonal mirror with several reflecting partial mirror surfaces. The light beam generating device is provided for generating a parallel light beam in two different beam positions which, in response to a rotating position indicating signal indicating the rotating position of the polygonal mirror, can be switched over from a partial mirror surface to an adjacent partial mirror surface. Accordingly, a system is provided for the optical direction of a distant object, which system has a high capacity. In particular, the system permits the optical detection of distant objects, such as poorly recognizable obstacles, in the air space in the flight direction in front of an aircraft.

System for the optical detection of a distant object using a rotating mirror

An optical system for providing a useful light beam, having one or more optical components () which attenuate a useful light fraction with a first linear polarization state less strongly than a useful light fraction with a second linear polarization state different from the first state. A compensation unit is provided which includes a transmission plate () that is introduced into the useful light beam path () inclined (&#x3b2;) to the optical axis, and attenuates the useful light fraction with the first linear polarization state more strongly than that with the second linear polarization state. As a result, the imbalance, caused by the system without a compensation unit, of the two useful light fractions can be compensated completely or in any case partially. The optical system is used, for example, in illuminating systems and projection objectives of microlithographic projection exposure apparatuses.

Optical system for providing a useful light beam influenced by polarization

A zoom system that is particularly suited to use on an illumination device of a microlithographic projection exposure system and is configured in the form of a focal-length-zooming lens. The lenses of the zoom system define an object plane () and an image plane () that is a Fourier transform of the object plane. Both an intermediate pupillary plane () that is conjugate to the image plane and an intermediate field plane () that is a Fourier transform of the image plane lie between the object plane () and image plane (). At least one movable lens () is arranged in the vicinity of these intermediate image planes (). The system is characterized by a large expansion of the illuminated area on the image plane for short lengths of travel and light weights of these movable lenses ().

Zoom system, in particular, a zoom system for an illumination device of a microlithographic projection system

A zoom system for an illumination device of a microlithographic projection exposure system is configured in the form of a focal-length zoom lens. The lenses of the zoom system define an object plane () and an image plane () that is a Fourier transform of the object plane. The zoom system is characterized by a large expansion of the illuminated area in the image plane, where expansion factors (D) in excess of four are feasible and are obtained by employing lens groups () that are movable over large moving ranges.

Zoom system for an illumination device

An optical integrator for an illumination device of a microlithographic projection exposure system has a rod made of a material transparent for ultraviolet light and with a rectangular cross-section. A rod arrangement with, for example, seven small rods made of the same material is arranged before the entrance surface of the rod. The aspect ratio between width and height of the small rods is the inverse of the aspect ratio between width and height of the rod. The rod arrangement, or some analogous structure, surface or treatment substituted therefor, serves to compensate the direction-dependent total reflection losses of the rod.

Growing community of inventors

Immenstaad, Germany

Jess Koehler