Cymer, Inc.

Asml Netherlands B.v.

Jerzy R Hoffman

Igor Vladimirovich Fomenkov

William N Partlo

Alexander Igorevich Ershov

Oleh V Khodykin

Norbert R Bowering

Curtis L Rettig

Rodney D Simmons

Richard M Ness

Alexander Bykanov

Timothy S Dyer

Norbert Bowering

I Roger Oliver

Stephan T Melnychuk

Gerry M Blumenstock

R Mark Johnson

R Kyle Webb

John Viatella

Nam-Hyong Kim

Jason Paxton

Ernesto L Vargas

Alexander N Bykanov

Devices and methods for generating EUV light are disclosed. The device comprises an oscillator having an oscillator cavity length, L, and defining an oscillator path and a multi-pass optical amplifier coupled with the oscillator to establish a combined optical cavity including the oscillator path, the combined cavity having a length, L, where L=(N+x)*L, where 'N' is an integer and 'x' is a number between 0.4 and 0.6. The amplifier comprises a polarization discriminating optic inputting light traveling along a first beam path from the oscillator and having substantially a first linear polarization into the amplifier and outputting light having substantially a linear polarization orthogonal to the first polarization out of the amplifier along a second beam path.

Drive laser for EUV light source

A device comprising a laser source producing a continuous output on a beam path and an amplifier is disclosed. The device further includes a partially transmissive, partially reflective optic disposed on said beam path between said laser source and said amplifier. The device further includes a droplet generator positioned to deliver a droplet moving on a path intersecting said beam path, the droplet reflecting light to establish an optical cavity with said optic.

A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.

EUV light producing system and method utilizing an alignment laser

A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (E) and a small signal gain (g); and the second amplifier may have a gain medium characterized by a saturation energy (E) and a small signal gain (g), with (g)&#x3e;(g) and (E)&#x3e;(E). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.

A laser produced plasma ('LPP') extreme ultraviolet ('EUV') light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages. The laser passage aperture may define an opening large enough to let the drive laser beam pass without attenuation and small enough to substantially reduce debris passing through the laser passage aperture in the direction of the entrance window.

LPP EUV drive laser input system

Systems and methods for EUV Light Source metrology are disclosed. In a first aspect, a system for measuring an EUV light source power output may include a photoelectron source material disposed along an EUV light pathway to expose the material and generate a quantity of photoelectrons. The system may further include a detector for detecting the photoelectrons and producing an output indicative of EUV power. In another aspect, a system for measuring an EUV light intensity may include a multi-layer mirror, e.g., Mo/Si, disposable along an EUV light pathway to expose the mirror and generate a photocurrent in the mirror. A current monitor may be connected to the mirror to measure the photocurrent and produce an output indicative of EUV power. In yet another aspect, an off-line EUV metrology system may include an instrument for measuring a light characteristic and MoSi/Si multi-layer mirror.

Systems and methods for EUV light source metrology

The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

Extreme ultraviolet light source

A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In another aspect, an electrostatic grid may be positioned for interaction with ions to reduce ion energy, and a magnetic field may be used to deflect the reduced energy ions onto paths wherein the ions do not strike the internal component. In yet another aspect, a grid may be connected to a circuit tuned to a resonant frequency to reduce ion energy. For example, the resonant frequency may be substantially equal to an inverse of a time difference between the time when electrons reach the grid and a subsequent time when ions reach the grid.

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Escondido, CA, United States of America

Jerzy R Hoffman