Greyhawk Systems, Inc.

International Business Machines Corporation

Sharp Corporation

Jerry Leff

Frederic J Kahn

Bryan E Loucks

Kenneth G Witte

David E Stepner

Linden J Livoni

Paul N Kendrick

Nicholas J Clecak

Peter J Duke

Evan D Laganis

Joseph Shao-Ying Feng

Robert J Cox

Elizabeth A Nevis

Frederick J Kahn

Howard Simmons, Iii

Richard Albert

Leo C Liclican

Mark V Powell

An image projection apparatus in which an image object plane contains a plurality of reflecting images and a light source and optical system projects a beam on each of said plurality of images. Spaced projection lenses are positioned to receive the light reflected from the images and direct the light on a projection surface with the plurality of reflected images in coregistration.

Apparatus and method of forming and projecting high precision optical

An apparatus for a liquid crystal image projection system having a liquid crystal cell, including optical apparatus for inducing a uniform texture of scattering centers in a liquid crystal cell by impinging a pulse of optical energy on the liquid crystal cell, thereby the optical energy is absorbed and converted to thermal energy heating the liquid cyrstal to a second temperture, the end of the pulse bringing about a cooling which causes the liquid crystal centers within the liquid crystal cells to scatter in a uniform texture.

Biphenyl derivatives for photostabilization in pulsed optical darkening

An image projection apparatus in which an image object plane contains a plurality of reflecting images and a light source and optical system projects a beam on each of said plurality of images. Spaced projection lenses are positioned to receive the light reflected from the image and direct the light on a projection surface with the plurality of reflected images in coregistration.

An apparatus for projecting high precision optical images with a selective heating source, advantageously a laser, on a writable, erasable, editable electronic slide and simultaneously or sequentially projecting the images in registration, onto a receiving surface such as a projection screen or photosensitive material, in the former case for the purpose of displaying the projected image and in the latter case for the purpose of creating a hard copy of the projected image.

A liquid crystal cell for an image projection apparatus has a liquid crystal layer sandwiched between two conductive layers. The layer surface is divided into one or more regions and one of the sandwiching conductive layers is divided into separate sections each matching a different region. Busbars are bonded on the other of these conductive layers along the edges and boundary lines between adjacent regions (resistors) such that negative and positive writing/erasing can be performed in selected region or regions. By applying one or more current pulses in one or more of these resistors, the corresponding region or regions can be more completely erased and a uniform dark background can be created therein.

Liquid crystal cell for image projections and method of operating same

The orientation of the alignment layer in a raster-scanned thermally addressed smectic liquid crystal display device can be chosen relative to the writing orientation to accentuate a selected characteristic. A perpendicular alignment with respect to the scan direction produces uniformly written images in both scan directions to allow high quality bidirectional writing. In a preferred embodiment the liquid crystal cell includes a liquid crystal material comprising 4-octyloxy-4'-cyanobiphenyl 37.5%, 4-decyl-4'-cyanobiphenyl 36.8% weight percent and 4-undecyl-4'-cyanobiphenyl 25.7 weight percent.

Alignment layer orientation in raster scan thermally addressed smectic

This single level masking process includes the use of two layers of a positive photoresist. A pattern is formed in the first layer of photoresist. This photoresist pattern is heated and polymerized to a degree which permits it to be resistant to attack when covered with a second layer of the same positive photoresist, that is, the first photoresist pattern will maintain its integrity. After the heat treatment, the first layer pattern is substantially insensitive to actinic radiation and is easily stripped with conventional solvents. A pattern is formed in a second layer of photoresist that is different from the pattern formed in the first layer. After a first metal is deposited on portions of the substrates exposed in the second layer pattern, the second layer pattern is removed. A second metal is deposited on the portions of the substrate exposed in the first layer pattern and then that pattern is removed.

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Saratoga, CA, United States of America

Jerry Leff