Mapper Lithography IP B.v.

Asml Netherlands B.v.

Jerry Johannes Martinus Peijster

Guido De Boer

Alexander Hendrik Vincent Van Veen

Remco Jager

Diederik Geert Femme Verbeek

Michel Pieter Dansberg

Paul Ijmert Scheffers

Pieter Kappelhof

Dennis Kemperman

Rogier Martin Lambert Ellenbroek

Joris Anne Henri Van Nieuwstadt

Sander Baltussen

Willem Maurits Weeda

The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.

Adjustment assembly and substrate exposure system comprising such an adjustment assembly

Support arrangement for supporting a radiation projection system in a substrate processing apparatus, the support arrangement comprising:

Substrate processing apparatus

A target processing machine (), such as a lithography or inspection machine, comprising a rigid base plate (), a projection column () for projecting one or more optical or particle beams on to a target (), a support frame () supporting the projection column, the support frame being supported by and fixed to the base plate, a stage comprising a movable part () for carrying the target and a fixed part () being supported by and fixed to the base plate, a beam sensor () for detecting one or more of the beams projected by the column, the beam sensor at least in part being supported by and fixed to the base plate, and a vacuum chamber () enclosing the support frame and the column, for maintaining a vacuum environment in the interior space of the chamber, the vacuum chamber formed with the base plate forming part thereof, and supporting a plurality of wall panels () including a plurality of side wall panels () supported by and fixed thereto.

Vacuum chamber with a thick aluminum base plate

The invention relates to a substrate holding device comprising a holding plate, a base plate, an array of supports, and an array of droplets of a heat absorbing material. The holding plate comprises a first side for holding a substrate. The base plate is arranged at a distance from the holding plate and provides a gap between the base plate and the holding plate at a side of the holding plate opposite to the first side. The array of supports is arranged in between the holding plate and the base plate. The array of liquid and/or solid droplets is arranged in between the holding plate and the base plate, and the droplets are arranged to contact both the base plate and the holding plate. The droplets are arranged spaced apart from each other and from the supports, and are arranged adjacent to each other in a direction along the gap.

Substrate holding device, method for manufacturing such a device, and use of such a device in a lithography system

The invention relates to a substrate processing apparatus () comprising a support frame (), a radiation projection system () for projecting radiation onto a substrate to be processed, a substrate support structure () for supporting the substrate, and a fluid transfer system (). The radiation projection system comprises a cooling arrangement () and is supported by and vibrationally decoupled from the support frame such that vibrations of the support frame above a predetermined maximum frequency are substantially decoupled from the radiation projection system. The fluid transfer system comprises at least one tube () fixed at two points (), and comprises a flexible portion. A substantial part of the flexible portion extends over a plane substantially parallel to the substrate support structure surface. The stiffness of the flexible portion is adapted to substantially decouple vibrations at the second fixed point which are above the predetermined maximum frequency from the first fixed point.

The invention relates to a projection system for projecting one or more beams on a target, said system comprising a frame, a projection module comprising a beam source for providing the one or more beams, projection optics for projecting beams on the target, a target positioning module, comprising a carrier for carrying the target, a stage for carrying and positioning the carrier, a measurement system for determining a position of the projection module relative to the carrier, a controller adapted for controlling the target positioning module to position the target under the projection module based on said determined position, wherein the projection module is connected to the frame via a flexible coupling for dampening the propagation of vibrations from said frame to said projection module, and wherein the controller is adapted control the target positioning module to compensate for residual vibrations as measured by said measurement system.

Projection system with flexible coupling

An assembly and a method for lifting a module of a lithography system from its support and a lithography system including such device are provided. The assembly includes a body and a track. The track comprises a ramp. The body is provided with two wheels. The first wheel vertically may extend a distance h further from a central horizontal plane of the body than the second wheel. An axis of the first wheel may be positioned in the horizontal direction at a distance D from an axis of the second wheel. The track may include a first and a second ramp. The first ramp is positioned at a distance D from the second ramp in the horizontal direction and a distance h in the vertical direction. Insertion of the body between the module and the support causes the module to be lifted from the support.

Assembly and a method for lifting a module of a lithography system in a vertical direction and a lithography system comprising such assembly

The invention relates to a target processing tool, comprising a target carrier guidance assembly, said target carrier guidance assembly comprising:

Guidance for target processing tool

The invention relates to a support structure for supporting a wafer table in a lithography system, said support structure comprising:

Support structure for wafer table

A target positioning device, in particular for a lithography system, comprising a carrier for carrying a target, and a stage for carrying and moving the carrier along a first direction (X). The stage comprising two X-stage bases, both arranged on top of a common base plate, each X-stage base carries an X-stage carriage, and a Y-beam comprising a Y-stage for carrying said carrier and moving the carrier said carrier in a second direction (Y). The Y-beam bridges the space between the X-stage carriages and is connected to the X-stage carriages via a flexible coupling. The device further comprises two motors each for driving a corresponding X-stage carriage along its corresponding X-stage base. The two motors are arranged at least substantially below the stage. Each motor of said two motors is coupled to an eccentric cam or crank which is connected to the corresponding X-stage carriage via a crank shaft.

Target positioning device, method for driving a target positioning device, and a lithography system comprising such a target positioning device

The invention relates to a vibration isolation module () for a lithographic apparatus or an inspection apparatus. The module comprises a support frame (), an intermediate body () and a support body () for accommodating the lithographic apparatus. The intermediate body is connected to the support frame by means of at least one spring element such that the intermediate body is a hanging body. The support body is connected to the intermediate body by means of at least one pendulum rod () such that the support body is a hanging body. The invention further relates to a substrate processing system comprising such vibration isolation module.

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Maartensdijk, Netherlands

Jerry Johannes Martinus Peijster