Taiwan Semiconductor Manufacturing Comp. Ltd.

Jerry Hwang

Chen-Hua Douglas Yu

Yi-Li Hsiao

Jyh-Cherng Sheu

Yu-Liang Lin

Jean Wang

Lawrance Sheu

Cheng Hsun Chan

A PVD target structure for use in physical vapor deposition. The PVD target structure includes a consumable slab of source material and one or more detectors for indicating when the slab of source material is approaching or has been reduced to a given quantity representing a service lifetime endpoint of the target structure.

PVD target with end of service life detection capability

A chemical mechanical polish system for polishing a wafer includes a polishing head; an inner tube connected to the polishing head, wherein the inner tube is filled with a heat media; a media heater connected to the inner tube; and a pressure controller connected to the inner tube.

CMP system with temperature-controlled polishing head

Apparatus for polishing are provided. An apparatus comprises a fluid controller, a polishing apparatus and a fluid interface membrane. The fluid controller is fluidly coupled to the polishing apparatus by way of at least one conduit. The fluid interface membrane is disposed within at least one of the fluid controller, the conduit and the polishing apparatus to separate a first fluid and a second fluid and to transfer pressure from the first fluid to the second fluid.

Polishing apparatus

Growing community of inventors

Hsinchu, Taiwan

Jerry Hwang