Texas Instruments Corporation

Other

Jerry D Merryman

William G Manns

Don J Weeks

Anthony B Wood

Thomas C Penn

Vernon R Porter

S Charles Baber

Michael J Cochran

Edward R Caudel

Chyi N Sheng

A laser pattern inspection and/or writing system which writes or inspects a pattern on a target on a stage, by raster scanning the target pixels. Inspection can also be done by substage illumination with non-laser light. A database, organized into frames and strips, represents an ideal pattern as one or more polygons. Each polygon's data description is contained within a single data frame. The database is transformed into a turnpoint polygon representation, then a left and right vector representation, then an addressed pixel representation, then a bit-mapped representation of the entire target. Most of the transformations are carried out in parallel pipelines. Guardbands around polygon sides are used for error filtering during inspection. Guardbands are polygons, and frames containing only guardband information are sent down dedicated pipelines. Error filtering also is done at the time of pixel comparisons of ideal with real patterns, and subsequently during defect area consolidation. Defect areas are viewed as color overlays of ideal and actual target areas, from data generated during real time. Defect areas can be de-zoomed to allow larger target areas to be viewed. An autofocus keeps the scanning laser beam in focus on the target. The inspection system is used to find fiducial marks to orient the target prior to raster scanning. IC bars are provided with alignment marks for locating each IC bar. Interferometers or glass scale encoders allow the stage position to be known.

Laser pattern/inspector with a linearly ramped chirp deflector

A method and apparatus for precise control of a galvanometer patterning system is provided in which a patterning beam (12) is deflected off of a galvanometer mirror (14) toward a work piece (10). The position of the galvanometer mirror (14) is determined by generating a measurement beam (20), transmitting it through a cylinder lens (26) and deflecting it off of the galvanometer mirror (14). The deflected measurement beam (20) is filtered through grating filter (28) having two side-by-side gratings. Light passing through the side-by-side gratings filter (28) is focused on a detector (36) through an anamorphic condenser (32 and 34).

Method and apparatus for precision control of galvanometer patterning

A laser pattern inspection and/or writing system which writes or inspects a pattern on a target on a stage, by raster scanning the target pixels. Inspection can also be done by substage illumination with non-laser light. A database, organized into frames and strips, represents an ideal pattern as one or more polygons. Each polygon's data decription is contained within a single data frame. The database is transformed into a turnpoint polygon representation, then a left and right vector representation, then an addressed pixel representation, then a bit-mapped representation of the entire target. Most of the transformations are carried out in parallel pipelines. Guardbands around polygon sides are used for error filtering during inspection. Guardbands are polygons, and frames containing only guardband information are sent down dedicated pipelines. Error filtering also is done at the time of pixel comparisons of ideal with real patterns, and subsequently during defect area consolidation. Defect areas are viewed as color overlays of ideal and actual target areas, from data generated during real time. Defect areas can be de-zoomed to allow larger target areas to be viewed. An autofocus keeps the scanning laser beam in focus on the target. The inspection system is used to find fiducial marks to orient the target prior to raster scanning. IC bars are provided with alignment marks for locating each IC bar. Interferometers or glass scale encoders allow the stage position to be known.

Position compensation of laser scan for stage movement

Pattern comparator with substage illumination and polygonal data

A laser pattern inspection and/or writing system which writes or inspects a pattern on a target on a stage, by raster scanning the target pixels. An autofocus keeps the scanning laser beam in focus on the target. The autofocus system includes an objective lens assembly through which a first laser beam is directed onto a writing surface, an autofocus laser which is detected by a photodetector after it is reflected from the surface of a target, and a linear magnetic motor for moving a lens in the objective lens assembly to keep the first laser beam focused on the writing surface.

Autofocus system for scanning laser inspector or writer

A transceiver receives electronic input signals comprised of a plurality of frequency bands lying within a plurality of non-overlapping frequency channels. A mixer frequency shifts a selected band to a predetermined center frequency in response to a first clocking signal of a first selectable frequency. A charge transfer device filter is coupled to the mixer output to filter the band of the predetermined center frequency in response to a second selectable frequency clocking signal. The clocking signals are generated by clocking means which receive digital microcommands identifying the selectable frequencies. Signal level measuring means are coupled to the output of the charge transfer device filter and generate digital level signals indicating the signal level present in the filtered band. Microprocessor means are coupled to send microcommands to the clocking means for sequentially filtering various channels from the plurality, and for monitoring the resulting digital level signals.

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Dallas, TX, United States of America

Jerry D Merryman