Taiwan Semiconductor Manufacturing Comp. Ltd.

TSMC Nanjing Company, Limited

Jerry Chang Jui Kao

Hui-Zhong Zhuang

Yung-Chen Chien

Lee-Chung Lu

Tzu-Ying Lin

Wei-Hsiang Ma

Sheng-Hsiung Chen

Chi-Lin Liu

Shang-Chih Hsieh

Xiangdong Chen

Huang-Yu Chen

Zhe-Wei Jiang

Chi-Yu Lu

Huaixin Xian

Yu-Lun Ou

Ruei-Wun Sun

Ji-Yung Lin

Chung-Te Lin

Chih-Liang Chen

Chung-Hsing Wang

Ting-Wei Chiang

Po-Hsiang Huang

Jack Liu

Jung-Chan Yang

Chin-Chou Liu

Chun-Chen Chen

Kai-Chi Huang

Cheng-Yu Lin

Johnny Chiahao Li

Kuo-Nan Yang

Yu-Ti Su

Pin-Dai Sue

Guo-Huei Wu

Jiun-Jia Huang

Qingchao Meng

Sung-Yen Yeh

Li Chung Hsu

Wei-Ren Chen

Chien-Hsing Li

Seid Hadi Rasouli

Sang Hoo Dhong

Fong-yuan Chang

Fong-Yuan Chang

Cheng-Chung Lin

Pochun Wang

Cheok-Kei Lei

Shao-Lun Chien

Chung-hsing Wang

Jung-chan Yang

Jia-Hong Gao

Hsueh-Chih Chou

Chia Hao Tu

Meng-kai Hsu

Changlin Huang

I-Wen Wang

Shih-Ming Chang

Chih-Wei Chang

Stefan Rusu

Ken-Hsien Hsieh

Chin-Shen Lin

Chih-wei Chang

Po-Chia Lai

Wei-Ling Chang

Jian-Sing Li

Ming-Tao Yu

Kuang-Ching Chang

Liu Han

Shang-Hsuan Chiu

Zhang-Ying Yan

Sheng-hsiung Chen

Anurag Verma

Ming-Chang Kuo

Meng-Kai Hsu

Shang-chih Hsieh

Cheng-yu Lin

Chia-Chun Wu

Xing Chao Yin

Shi-han Zhang

You-cheng Lai

Yi-Lin Fan

Longbiao Lei

Sinpei Goa

Po-Chih Cheng

Pei-Wei Liao

Yung-Chen Chen

A method of forming an integrated circuit (IC) includes generating a netlist of a first circuit, generating a first cell layout of the first circuit, placing the first cell layout, by an automatic placement and routing (APR) tool, in a first region of a layout design. The first circuit is configured as a non-functional circuit. The first circuit includes a first pin and a second pin that are electrically disconnected from each other. Generating the netlist of the first circuit includes designating the first pin and the second pin as a first group of pins that are to be connected together. Placing the first cell layout by the APR tool includes connecting the first pin and the second pin in the first group of pins together thereby changing the first circuit to a second circuit. The second circuit is configured as a functional version of the first circuit.

Integrated circuit and method of forming the same

Metallization structure for an integrated circuit. In one embodiment, an integrated circuit includes a metal-to-diffusion (MD) layer disposed over an active region of a cell, gates disposed over the active region of the cell, and a first metallization layer including M0 tracks disposed over the MD layer and the gates. The integrated circuit further includes a second metallization layer including M1 tracks disposed over the first metallization layer. The M1 tracks include first M1 tracks each having a first predetermined distance from an edge of the cell and second M1 tracks each having a second predetermined distance from the edge of the cell, wherein the first M1 tracks are longer than the second M1 tracks.

Semiconductor metal layer structure over cell region

A flip-flop circuit includes a first inverter configured to receive a first clock signal and output a second clock signal, a second inverter configured to receive the second clock signal and output a third clock signal, a master latch including a transmission circuit, and a slave latch including a first feedback inverter. The first feedback inverter includes a first transistor configured to receive the first clock signal and a second transistor configured to receive the second clock signal, and the transmission circuit includes a third transistor configured to receive the third clock signal.

Flip-flop circuit and method

An integrated circuit includes a device, a first interconnect structure disposed above the device and a second interconnect structure positioned below the device. The first interconnect structure includes multiple frontside metal layers. The second interconnect structure includes multiple backside metal layers, where each backside metal layer includes metal conductors routed according to diagonal routing. In some embodiments, a backside interconnect structure can include another backside metal layer that includes metal conductors routed according to mixed-Manhattan-diagonal routing. A variety of techniques can be used to route signals between metal conductors in the backside interconnect structure and cells on one or more frontside metal layers.

Diagonal backside power and signal routing for an integrated circuit

A circuit includes a first power node having a first voltage level, a second power node having a second voltage level different from the first voltage level, a reference node having a reference voltage level, a master latch that outputs a first bit based on a received bit, a slave latch that outputs a second bit based on the first bit and an output bit based on a selected one of the first bit or a third bit, a first level shifter that outputs the third bit based on a complementary bit pair, and a retention latch including a second level shifter and a pair of inverters that outputs the complementary bit pair based on the second bit. The slave latch and the first level shifter are coupled between the first power and reference nodes, and the retention latch is coupled between the second power and reference nodes.

Data retention circuit and method

A layout method includes generating a design data comprising an electronic circuit, and generating a design layout by placing a first cell corresponding to the electronic circuit. The first cell includes a first source/drain region and a second source/drain region extending in a first direction in a first layer, a gate electrode extending in a second direction perpendicular to the first direction in a second layer, and a first conductive line arranged in a third layer over the second layer and electrically connected to one of the first source/drain region, the second source/drain region and the gate electrode. The first cell is defined by a left cell side and a right cell side. At least one of the left cell side, the right cell side, the gate electrode and the first conductive line extends in a third direction not parallel to the first and second directions.

Structure and method of rectangular cell in semiconductor device

A device is disclosed that includes multiple channels and multiple processing nodes. Each processing node includes input/output (I/O) ports coupled to the channels and channel control modules coupled to the I/O ports. Each processing node is configured to select, by the channel control module in a first operation, a first I/O port of the I/O ports; communicate a first message, via the first I/O port, to a first processing node over a first channel or a second processing node over a second channel orthogonal to the first channel in a logic representation; select, by the channel control module in a second operation, a second I/O port of the I/O ports; and communicate a second message, via the second I/O port, to a third processing node over a third channel extending in a diagonal direction and non-orthogonal to the first and second channels in the logic representation.

Diagonal torus network

A semiconductor device, method, and system of arranging patterns of the same are provided. The method includes generating a plurality of gate patterns and conductive patterns, wherein each of the plurality of gate patterns and conductive patterns is located at a first horizontal level and extends along a first direction. The method also includes selecting one of the gate patterns as an input pin or one of the conductive patterns as an output pin. The method further includes generating, based on a selected gate pattern or a selected conductive pattern, a plurality of metallization patterns. Each of the plurality of metallization patterns is located at a second horizontal level overlying the first horizontal level and extends along a second direction substantially perpendicular to the first direction.

Semiconductor device and method and system of arranging patterns of the same

An integrated circuit (IC) device includes a substrate, at least one active region over the substrate and elongated along a first axis, at least one gate region extending across the at least one active region, and at least one input/output (IO) pattern configured to electrically couple one or more of the at least one active region and the at least one gate region to other circuitry. The at least one IO pattern extends obliquely to the at least one active region or the at least one gate region.

Integrated circuit device and method

An integrated circuit device includes a device layer having devices spaced in accordance with a predetermined device pitch, a first metal interconnection layer disposed above the device layer and coupled to the device layer, and a second metal interconnection layer disposed above the first metal interconnection layer and coupled to the first metal interconnection layer through a first via layer. The second metal interconnection layer has metal lines spaced in accordance with a predetermined metal line pitch, and a ratio of the predetermined metal line pitch to predetermined device pitch is less than 1.

Integrated circuit device with improved layout

A method including: providing a design data of an integrated circuit (IC), the design data comprising a first cell; identifying a first conductive line in the first cell as a critical internal net of the first cell, wherein the first conductive line is electrically connected between an input terminal of the first cell and an output terminal of the first cell; providing a library of the first cell, wherein the library includes a table of timing or power parameters of the first cell based on a multidimensional input set associated with the critical internal net; updating the design data by determining a timing or power value of the first cell based on the table; performing a timing analysis on the updated design data; and forming a photomask based on the updated design data.

Standard cell characterization for internal conductive line of cell

An IC device includes first and second power rails extending in a first direction and carrying one of a power supply or reference voltage, a third power rail extending between the first and second power rails and carrying the other of the power supply or reference voltage, and a plurality of transistors including first through fourth active areas extending between the first and second power rails, a plurality of gate structures extending perpendicularly to the first direction, and first and second conductive segments extending in the second direction across the third power rail. Each of the second and third active areas is adjacent to the third power rail, each of the first and second conductive segments is electrically connected to S/D structures in each of the second and third active areas, and the plurality of transistors is configured as one of an AOI, an OAI, or a four-input NAND gate.

IC logic device, layout, system, and method

A method includes forming a conductive member over a first conductive line; forming a second conductive line over the conductive member; and removing a portion of the conductive member exposed by the second conductive line to form a conductive via. The formation of the second conductive line is implemented prior to the formation of the conductive via. A semiconductor structure includes a first conductive line having a first surface; a second conductive line disposed above the first conductive line and having a second surface overlapping the first surface; and a conductive via electrically connected to the first surface and the second surface. The conductive via includes a first end disposed within the first surface, a second end disposed within the second surface, and a cross-section between the first end and the second end, wherein at least two of interior angles of the cross-section are substantially unequal to 90°.

Semiconductor structure and method for forming the same

An integrated circuit includes a first clocked forwarding-switch and a second clocked forwarding-switch each implemented with strong transistors in at least one strong active-region structure. The integrated circuit also includes a first clocked inverter and a second clocked inverter each implemented with weak transistors in at least one weak active-region structure. The integrated circuit further includes a first inverter cross coupled with the first clocked inverter and a second inverter cross coupled with the second clocked inverter. An output of the first clocked forwarding-switch is conductively connected with an output of the first clocked inverter, and an output of the second clocked forwarding-switch is conductively connected with an output of the second clocked inverter.

Flip-flops having strong transistors and weak transistors

A method performed by at least one processor includes the following steps: generating a layout of an integrated circuit (IC), the layout comprising a cell and a layout context in a vicinity of the cell; receiving from a library a set of context groups and a set of timing tables, wherein each of the context groups is associated with one of the set of timing tables; determining a representative context group for the cell through comparing the layout context of the cell with the set of context groups; and performing a timing analysis on the layout according to a representative timing table associated with the representative context group for the cell.

Layout context-based cell timing characterization

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Taipei, Taiwan

Jerry Chang Jui Kao