Dpix, LLC

Jerome David Crocco

Michael Robert Johnson

Sanjeev Tandon

Kevin Cadena

Michael Keith Forsyth

Geun Jo Han

Paul R O'Hern, Jr

Jinhui Cho

The phenomenon of charge trapping and its impact on noise performance of an imaging array using thin film transistor switches can be ameliorated by compensation techniques. One such compensation technique is a recovery process by which trapped charges are detrapped through the periodic imposition of thermal, optical, and/or bias energy. Another technique involves a shield line overlying the transistor switches and connected to the gate base to reduce the gate base resistance and hence reduce changes in the RC time constant of the gate bus.

Architecture for and method of operating a metal oxide based sensor

A quality improvement method for an image sensor array includes collecting in-line optical inspection data of the image sensor, collecting end of line electrical data of the image sensor, creating defect maps and obtaining x-y coordinates of the optical inspection data and the electrical data, correlating the defect maps to generate correlated defects, classifying the images of the correlated defects, and generating root cause statistics of the classified correlated defects.

Manufacturing quality improvement through statistical root cause analysis using convolution neural networks

A method for improving the performance of an image sensor array includes performing an electrical test on the image sensor array, generating a test image from the electrical test to detect an open circuit in a data line of the image sensor array, performing a laser-weld operation the data line to weld a portion of the data line to ground, re-testing the image sensor array to confirm a successful laser-weld operation, performing a laser-cut on a readout portion of the data line, and re-testing the image sensor array to confirm a successful laser-cut operation.

Method and functional architecture for inline repair of defective imaging arrays

A method of manufacturing an sensor array includes providing a glass substrate; forming a bottom electrode layer over the glass substrate; forming a sensor material layer over the bottom electrode layer; forming a top electrode layer over the sensor material layer; patterning the top electrode layer, the sensor material layer, and the bottom electrode layer using a first photoresist layer to form a plurality of pixels; detecting a defect in the plurality of pixels; and patterning the plurality of pixels using a second photoresist layer. The first photoresist layer includes a plurality of first pixel patterns and the second photoresist layer comprises a plurality of second pixel patterns, and wherein at least one of the second pixel patterns has an area greater than that of a corresponding first pixel pattern.

Growing community of inventors

Colorado Springs, CO, United States of America

Jerome David Crocco