Asml Netherlands B.v.

Jeroen Pieter Starreveld

Cornelius Adrianus Lambertus De Hoon

Hans Butler

Maurice Willem Jozef Etiënne Wijckmans

Joost Jeroen Ottens

Johannes Petrus Martinus Bernardus Vermeulen

Martinus Van Duijnhoven

Harmen Klaas Van Der Schoot

Boris Menchtchikov

Willem Jurrianus Venema

Fransiscus Mathijs Jacobs

Wouterus Johannes Petrus Maria Maas

Joep Sander De Beer

Pavel Kagan

Jan-Gerard Cornelis Van Der Toorn

Marc Wilhelmus Maria Van Der Wijst

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Noud Jan Gilissen

Marcel Koenraad Marie Baggen

Mark Constant Johannes Baggen

Stefan Geerte Kruijswijk

Robertus Johannes Marinus De Jongh

Stan Henricus Van Der Meulen

Michael Johannes Vervoordeldonk

Jeroen Johan Maarten Van De Wijdeven

Edward Hage

Evert Hendrik Jan Draaijer

Pieter Johannes Gertrudis Meijers

Francois Xavier Debiesme

Derk Ten Hoopen

Ingmar August Kerp

Wesley Ooms

Roy Hendrikus Emilie Maria Jacobs

Marinus Engelbertus Cornelis Mutsaers

The invention provides a support with first and second end portions. The second end portion is on the side opposite to the first end portion in a longitudinal direction of the support. A coil spring is arranged between the first and second end portions. The coil spring comprises a first spiral member that extends between the first and second end portions in a circumferential direction of the support, and a second spiral member that extends between the first and second end portions in a circumferential direction of the support. The first and second spiral members extend in the longitudinal direction around a longitudinal axis of the support, wherein the first spiral member of the coil spring and the second spiral member of the coil spring are moveable relative to each other, and wherein the support further comprises a damper device that is attached to the first spiral member.

Support, vibration isolation system, lithographic apparatus, object measurement apparatus, device manufacturing method

Disclosed is a projection system for a lithographic apparatus, comprising: a plurality of optical elements configured to direct a beam along a path, and a control system configured to receive an input signal indicative of a deformation of a first optical element of the plurality of optical elements. The plurality of optical elements may be configured to position the beam onto an object arranged on an object support, and a pattern may be imparted on the beam by a patterning device arranged on support structure. The control system is configured to generate an output signal for controlling a position of at least a second optical element of the plurality of optical elements, based on said input signal; and/or an output signal for controlling a position of said object support, based on said input signal; and/or an output signal for controlling a position of said support structure, based on said input signal.

Projection system and lithographic apparatus comprising said projection system

The invention provides a vibration isolation system (IS), comprising a piston () to carry a payload, a connecting member (), a spring () and a flexible member (). The spring is arranged to support the piston along a direction with a positive stiffness. The flexible member is arranged to apply a force to the piston along the direction via the connecting member with a negative stiffness.

Vibration isolation system and lithographic apparatus

A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.

Frame assembly, lithographic apparatus and device manufacturing method

The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.

Pneumatic support device and lithographic apparatus with pneumatic support device

The present invention relates to a lithographic apparatus, comprising: &#x2014;a primary frame () which is provided with a functional unit (), &#x2014;a secondary frame (), &#x2014;a primary frame support (), which is adapted to support the primary frame onto the secondary frame, &#x2014;a flexible utility connection (), adapted to connect the functional unit to an auxiliary system (), &#x2014;a vibration isolation body () having a body mass, which is moveably connected to the secondary frame by a flexible passive body support () having a body support stiffness, wherein the flexible utility connection is fixed to the vibration isolation body at a distance from the primary frame.

Lithographic apparatus, lithographic projection apparatus and device manufacturing method

The invention relates to a vibration isolator, comprising:

Vibration isolator, lithographic apparatus and device manufacturing method

A lithographic apparatus is described, the lithographic apparatus comprising:

Lithographic apparatus and device manufacturing method

A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.

Support device, lithographic apparatus and device manufacturing method

An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.

Imprint lithographic apparatus and imprint lithographic method

A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.

Lithographic apparatus and stage system

A lithographic apparatus includes an illumination system, a support, a substrate table, a projection system, and an actuator. The illumination system is configured to condition a radiation beam. The support is constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The substrate table is constructed to hold a substrate. The projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The actuator is constructed and arranged to exert a force on a part of the lithographic apparatus via an elongated structure. The elongated structure is provided with a vibration damper constructed and arranged to damp vibrations in the elongated structure.

A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.

Optimized correction of wafer thermal deformations in a lithographic process

A lithographic apparatus includes an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The lithographic apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus has a chuck system for supporting an object, such as the substrate or the patterning device, in the lithographic apparatus. The chuck system includes a chuck for supporting the object, a frame for supporting the chuck, and a chuck support structure for supporting the chuck relative to the frame. The chuck support structure includes at least one flexure element, which flexure element is flexible in at least one degree of freedom and is coupled to the chuck and the frame.

Growing community of inventors

Eindhoven, Netherlands

Jeroen Pieter Starreveld