Asml Netherlands B.v.

Asml Holding N.v.

Other

Asml Holdings N.v.

Jeroen Johannes Sophia Maria Mertens

Christiaan Alexander Hoogendam

Sjoerd Nicolaas Lambertus Donders

Bob Streefkerk

Johannes Catharinus Hubertus Mulkens

Erik Roelof Loopstra

Hans Jansen

Johannes Jacobus Matheus Baselmans

Helmar Van Santen

Aleksey Yurievich Kolesnychenko

Roelof Frederik De Graaf

Joeri Lof

Alexander Straaijer

Timotheus Franciscus Sengers

Jan-Gerard Cornelis Van Der Toorn

Klaus Simon

Martinus Cornelis Maria Verhagen

Martinus Hendrikus Antonius Leenders

Franciscus Johannes Herman Maria Teunissen

Patricius Aloysius Jacobus Tinnemans

Michel Riepen

Joost Jeroen Ottens

Henrikus Herman Marie Cox

Erik Theodorus Maria Bijlaart

Joannes Theodoor De Smit

Hendricus Johannes Maria Meijer

Hans Butler

Frits Van Der Meulen

Roelof Aeilko Siebrand Ritsema

Frank Van Schaik

Nicolaas Ten Kate

Marco Koert Stavenga

Bernardus Antonius Slaghekke

Jacobus Johannus Leonardus Hendricus Verspay

Nicolaas Rudolf Kemper

Johannes Henricus Wilhelmus Jacobs

Herman Vogel

Herman Boom

Johannes Petrus Maria Smeulers

Stefan Philip Christiaan Belfroid

Marcel Mathijs Theodore Marie Dierichs

Antonius Theodorus Anna Maria Derksen

Antonius Johannus Van Der Net

Franciscus Johannes Joseph Janssen

Marcus Adrianus Van De Kerkhof

Boris Menchtchikov

Felix Godfried Peter Peeters

Koen Goorman

Edwin Augustinus Matheus Van Gompel

Arie Jeffrey Den Boef

Mark Kroon

Martijn Houkes

Sergei Shulepov

Theodorus Petrus Maria Cadee

Richard Joseph Bruls

Frederik Eduard De Jong

Stoyan Nihtianov

Martin Frans Pierre Smeets

Ronald Walther Jeanne Severijns

Bart Leonard Peter Schoondermark

Johannes Anna Quaedackers

Christianus Gerardus Maria De Mol

Richard Moerman

Peter Smits

Gerardus Petrus Matthijs Van Nunen

Marcel Johannus Elisabeth Hubertus Muitjens

Marco Polizzi

Aschwin Lodewijk Hendricus Johannes Van Meer

Jan Cornelis Van Der Hoeven

Cedric Desire Grouwstra

Maria Elisabeth Reuhman-Huisken

Lejla Seuntiens-Gruda

Edwin Van Gompel

Koen Jacobus Johannes Maria Zaal

Hernes Jacobs

Minne Cuperus

Sebastiaan Maria Johannes Cornelissen

Paulus Martinus Maria Liebregts

Aschwin Lodewijk Hendricus Johannes Vermeer

Gheorghe Tanasa

Youri Johannes Laurentius Maria Van Dommelen

Jimmy Matheus Wilhelmus Van De Winkel

Peter Paul Steijaert

Pieter Renaat Maria Hennus

Patrick Johannes Cornelus Hendrik Smulders

Robert Douglas Watso

Maurice Martinus Johannes Van Der Lee

Levinus Pieter Bakker

Marcel Beckers

Ronald Van Der Ham

Wilhelmus Franciscus Johannes Simons

Teunis Cornelis Van Den Dool

Paul Petrus Joannes Berkvens

Anthonius Martinus Cornelis Petrus De Jong

Eva Mondt

Antonius Johannes Van Der Net

Nicolas Alban Lallemant

Frank B Sperling

Suzan Leonie Auer-Jongepier

Alexander Nikolov Zdravkov

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Lithographic apparatus and device manufacturing method involving a heater

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

Growing community of inventors

Duizel, Netherlands

Jeroen Johannes Sophia Maria Mertens