Asml Netherlands B.v.

Jeroen De Boeij

Johannes Petrus Martinus Bernardus Vermeulen

Sven Antoin Johan Hol

Theodorus Petrus Maria Cadee

Jan Van Eijk

Antonius Franciscus Johannes De Groot

Yang-Shan Huang

Wilhelmus Henricus Theodorus Maria Aangenent

Johannes Antonius Gerardus Akkermans

Maarten Hartger Kimman

Gerard Johannes Pieter Nijsse

Simon Bernardus Cornelis Maria Martens

George Wilhelmus Johannes Clijsen

Michael Wilhelmus Theodorus Koot

Jacob Kornelis Ter Veer

Wei Zhou

Antonius De Groot

Theodorus Cadee

A variable reluctance device includes first and second magnetic members, a coil, a measurement coil, and a control unit. The first and second magnetic members are displaceable relative to each other to provide a magnetic circuit having a variable reluctance. The coil for, in use, receiving a current for generating a magnetic flux through the magnetic circuit. The measurement coil for generating a measurement signal representative of the magnetic flux through the magnetic circuit, whereby the measurement coil is arranged to substantially enclose the magnetic flux through the magnetic circuit. The control unit arranged to receive the flux signal at an input terminal and, in response, provide a control signal based on the measurement signal at an output terminal for controlling an amplitude of the current or a force of a further device. The device can e.g., be applied in a stage apparatus or a lithographic apparatus.

Variable reluctance device, stage apparatus, lithographic apparatus and device manufacturing method

A lithography apparatus comprises a projection system arranged to transfer a pattern from a patterning device onto a substrate, a carrier, and a drive system for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y. The drive system comprises a shuttle moving parallel to the Y-axis, a shuttle connector connecting the shuttle to the carrier, the shuttle connector allowing movement of the carrier in a direction parallel to the X-axis relative to the shuttle, and a shuttle driver driving movement of the shuttle parallel to the Y-axis. The shuttle is located to one side of the carrier in a direction parallel to the X-axis and it is desirable if only one of the shuttle is connected to the carrier.

Lithographic apparatus and device manufacturing method

An electromagnetic actuator includes a first and second magnetic members that are displaceable relative to each other and are arranged to provide a magnetic circuit; and a coil configured to, in use, receive a current to generate a magnetic flux through the magnetic circuit, thereby generating a force between the first and second magnetic members in a first direction, the magnetic flux, in use, being transferred between the first and second magnetic members through a first surface of the first magnetic member and a second surface of the second magnetic member, the first and second surface being separated by an airgap, wherein the first surface and the second surface are arranged relative to each other such that an outer dimension of the first surface extends beyond an outer dimension of the second surface in a second direction substantially perpendicular to the first direction.

Electromagnetic actuator, stage apparatus and lithographic apparatus

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Eindhoven, Netherlands

Jeroen De Boeij