Nxp B.v.

Nexperia B.v.

Jeroen Antoon Croon

Johannes Josephus Theodorus Marinus Donkers

Jan Sonsky

Godefridus Adrianus Maria Hurkx

Stephan Heil

Andreas Bernardus Maria Jansman

Tim Boettcher

Markus Mueller

Stephen John Sque

Coenraad Cornelis Tak

Stephan Bastiaan Simon Heil

Mark Andrzej Gajda

Godefridus Andrianus Maria Hurkx

A semiconductor device and a method of making the same. The device includes a substrate mounted on a carrier, the substrate comprising a High Electron Mobility Transistor (HEMT) having a source, a gate and a drain. The carrier comprises an electrically conductive shielding portion for providing shielding against electromagnetic interference associated with switching of the device during operation. The electrically conductive shielding portion is electrically isolated from the source and from the backside of the substrate.

Semiconductor device and a method of making a semiconductor device

A semiconductor device and a method of making the same is disclosed. The device includes a substrate having an AlGaN layer located on a GaN layer for forming a two dimensional electron gas at an interface between the AlGaN layer and the GaN layer. The device also includes a plurality of contacts. At least one of the contacts includes an ohmic contact portion located on a major surface of the substrate. The ohmic contact portion comprises a first electrically conductive material. The at least one of the contacts also includes a trench extending down into the substrate from the major surface. The trench passes through the AlGaN layer and into the GaN layer. The trench is at least partially filled with a second electrically conductive material. The second electrically conductive material is a different electrically conductive material to the first electrically conductive material.

Gallium nitride/ aluminum gallium nitride semiconductor device and method of making a gallium nitride/ aluminum gallium nitride semiconductor device

A semiconductor device and a method of making the same are disclosed. The device includes a substrate including an AlGaN layer located on a GaN layer for forming a two dimensional electron gas at an interface between the AlGaN layer and the GaN layer. The device also includes a plurality of electrical contacts located on a major surface of the substrate. The device further includes a plurality of passivation layers located on the major surface of the substrate. The plurality of passivation layers includes a first passivation layer of a first passivation material contacting a first area of the major surface and a second passivation layer of a second passivation material contacting a second area of the major surface. The first and second passivation materials are different passivation materials. The different passivation materials may be compositions of silicon nitride that include different proportions of silicon.

Semiconductor device and method of making a semiconductor device with passivation layers providing tuned resistance

A semiconductor device and a method of making the same. The device includes a substrate having an AlGaN layer located on one or more GaN layers, for forming a two dimensional electron gas at an interface between the AlGaN layer and the GaN layer. The device also includes a source contact. The device further includes a drain contact. The device also includes a gate contact located between the source contact and the drain contact. The gate contact includes a gate electrode. The gate contact also includes an electrically insulating layer located between the gate electrode and the AlGaN layer. The insulating layer includes at least one aperture for allowing holes generated during an off-state of the device to exit the device through the gate electrode.

Semiconductor device and method of making a semiconductor device

A semiconductor device and a method of making the same. The semiconductor device includes a semiconductor substrate mounted on a carrier. The semiconductor substrate includes a Schottky diode. The Schottky diode has an anode and a cathode. The semiconductor device also includes one or more bond wires connecting the cathode to a first electrically conductive portion of the carrier. The semiconductor device further includes one or more bond wires connecting the anode to a second electrically conductive portion of the carrier. The first electrically conductive portion of the carrier is electrically isolated from the second electrically conductive portion of the carrier. The first electrically conductive portion of the carrier is configured to provide shielding against electromagnetic interference associated with switching of the anode during operation of the device. Both the cathode and the first electrically conductive portion of the carrier are electrically isolated from a backside of the semiconductor substrate.

Semiconductor device

In an example embodiment, a heterojunction device comprises a substrate, a multilayer structure disposed on the substrate. The multilayer structure has a first layer having a first semiconductor disposed on top of the substrate; a second layer has a second semiconductor is disposed on top of the first layer defining an interface between them. The second semiconductor differs from the first semiconductor such that a 2D Electron Gas forms adjacent to the interface. A first terminal couples to a first area of the interface between the first and second layers and a second terminal couples to a second area of the interface between the first and second layers; an electrically conducting channel comprises a metal or a region of the first layer with a higher defect density than another region of the first layer. The channel connects the second terminal and a region of the first layer such that electric charge can flow between them.

Semiconductor heterojunction device

Disclosed is a semiconductor device comprising a group 13 nitride heterojunction comprising a first layer having a first bandgap and a second layer having a second bandgap, wherein the first layer is located between a substrate and the second layer; and a Schottky electrode and a first further electrode each conductively coupled to a different area of the heterojunction, said Schottky electrode comprising a central region and an edge region, wherein the element comprises a conductive barrier portion located underneath said edge region only of the Schottky electrode for locally increasing the Schottky barrier of the Schottky electrode. A method of manufacturing such a semiconductor device is also disclosed.

Heterojunction semiconductor device and manufacturing method

Heterojunction semiconductor device with conductive barrier portion and manufacturing method

Consistent with an example embodiment, a GaN heterojunction structure has a three-layer dielectric structure. The lowermost and middle portions of the gate electrode together define the gate foot, and this is associated with two dielectric layers. A thinner first dielectric layer is adjacent the gate edge at the bottom of the gate electrode. The second dielectriclayer corresponds to the layer in the conventional structure, and it is level with the main portion of the gate foot.

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Waalre, Netherlands

Jeroen Antoon Croon