Spansion Llc.

Jeremy Wahl

Shenqing Fang

Kuo-Tung Chang

Yi Ma

Jean Y Yang

Youseok Suh

Rinji Sugino

Eunha Kim

A semiconductor fabrication system and method are presented. A three dimensional multilayer integrated circuit fabrication method can include forming a first device layer and forming a second device layer on top of the first device layer with minimal detrimental heat transfer to the first layer by utilizing a controlled laser layer formation annealing process. A controlled laser crystallization process can be utilized and the controlled laser can include creating an amorphous layer; defining a crystallization area in the amorphous layer, where in the crystallization area is defined to promote single crystal growth (i.e. prevent multi-crystalline growth); and applying laser to the crystallization area, wherein the laser is applied in a manner that prevents undesired heat transfer to another layer.

3-D integrated circuit system and method

Growing community of inventors

Sunnyvale, CA, United States of America

Jeremy Wahl