Centre National De La Recherche Scientifique

Stmicroelectronics(tours) Sas

Jeremy Cure

Bruno Chaudret

Pierre Fau

Kilian Piettre

A surface of a silicon substrate is coated with a silicon oxide layer. A manganese silicate layer is then deposited on the silicon oxide layer using a process of performing at least one step of dipping the substrate into a manganese amidinate solution. A copper layer is then deposited on the manganese silicate layer using a process of performing a step of dipping the substrate into a copper amidinate solution. An anneal is performed to stabilize one or both of the manganese silicate layer and copper layer.

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Paris, France

Jeremy Cure