Lam Research Corporation

Jeremiah Baldwin

Purushottam Kumar

Jun Qian

Adrien Lavoie

Sung Je Kim

You Zhai

Karl Frederick Leeser

Shankar Swaminathan

Ramesh Chandrasekharan

Hu Kang

Frank Loren Pasquale

David Charles Smith

Chloe Baldasseroni

Mohamed Sabri

Adrien LaVoie

Andrew Duvall

Jeongseok Ha

Eashwar Ranganathan

Ingi Bae

Sudarshan Manjunath

Samuel Jacob Monroe

Heather Landis

Connector backshell

A method for delivering vaporized precursor in a substrate processing system using a vapor delivery system includes (a) selectively supplying push gas to an inlet of an ampoule storing liquid and vaporized precursor during a deposition period of a substrate; (b) measuring a pressure of the push gas and the vaporized precursor at an outlet of the ampoule during the deposition period; (c) determining a maximum pressure during the deposition period; (d) determining an integrated area for the deposition period based on a sampling interval and the maximum pressure during the sampling interval; and (e) repeating (a), (b), (c) and (d) for a plurality of the deposition periods for the substrate.

Systems and methods for flow monitoring in a precursor vapor supply system of a substrate processing system

A vapor delivery system includes an ampoule to store liquid precursor and a heater to partially vaporize the liquid precursor. A first valve communicates with a push gas source and the ampoule. A second valve supplies vaporized precursor to a heated injection manifold. A valve manifold includes a first node in fluid communication with an outlet of the heated injection manifold, a third valve having an inlet in fluid communication with the first node and an outlet in fluid communication with vacuum, a fourth valve having an inlet in fluid communication with the first node and an outlet in fluid communication with a second node, a fifth valve having an outlet in fluid communication with the second node, and a sixth valve having an outlet in fluid communication with the second node. A gas distribution device is in fluid communication with the second node.

Systems and methods for vapor delivery in a substrate processing system

Growing community of inventors

Tualatin, OR, United States of America

Jeremiah Baldwin