Asml Netherlands B.v.

Jeonghyun Park

Daan Maurits Slotboom

Hadi Yagubizade

Yingchao Cui

Sarathi Roy

Jeroen Cottaar

Yichen Zhang

Xiuhong Wei

Mohammad Reza Kamali

Min-Seok Kim

Sang Uk Kim

A method for determining lithographic matching performance includes obtaining first monitoring data from recurrent monitoring for stability control for an available EUV scanner. For a DUV scanner, second monitoring data is similarly obtained from recurrent monitoring for stability control. The EUV first monitoring data are in a first layout. The DUV second monitoring data are in a second layout. A cross-platform overlay matching performance between the first lithographic apparatus and the second lithographic apparatus is determined based on the first monitoring data and the second monitoring data. This is done by reconstructing the first and/or second monitoring data into a common layout to allow comparison of the first and second monitoring data.

Determining lithographic matching performance

A method of determining a control setting for a lithographic apparatus. The method includes obtaining a first correction for a current layer on a current substrate based on first metrology data associated with one or more previous substrates, and obtaining a second correction for the current layer on the current substrate. The second correction is based on a residual determined based on second metrology data associated with a previous layer on the current substrate. The method further includes determining the control setting for the lithographic apparatus for patterning the current layer on the current substrate by combining the first correction and the second correction.

Method for controlling a lithographic apparatus

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Eindhoven, Netherlands

Jeonghyun Park