Samsung Electronics Co., Ltd.

Jeong-meung Kim

Ki-chul Kim

Han-Mei Choi

Bong-jin Kuh

Eun-ha Lee

Jong-sung Lim

Joong-han Shin

A method of forming an epitaxial layer includes forming a plurality of first insulation patterns in a substrate, the plurality of first insulation patterns spaced apart from each other, forming first epitaxial patterns on the plurality of first insulation patterns, forming second insulation patterns between the plurality of first insulation patterns to contact the plurality of first insulation patterns, and forming second epitaxial patterns on the second insulation patterns and between the first epitaxial patterns to contact the first epitaxial patterns, the first epitaxial patterns and the second epitaxial patterns forming a single epitaxial layer.

Growing community of inventors

Seoul, South Korea

Jeong-meung Kim