Lg Display Co., Ltd.

Jeong-Kweon Park

Sung-Eun Kim

O-Jun Kwon

A sputtering apparatus comprises a plurality of independent plasma generation regions formed in a single process chamber; a cathode disposed at an edge portion of each of the plurality of independent plasma generation regions; a gas supply line to supply a reaction gas to the plurality of independent plasma generation regions; and a shielding film disposed between the plurality of independent plasma generation regions to prevent reaction gases generated in the plurality of independent plasma generation regions from being mixed and introduced to an outside.

Sputtering apparatus

An apparatus for coating a photoresist onto a substrate includes a slit nozzle to apply the photoresist to the substrate, a slit nozzle driving unit to move the slit nozzle, and a photoresist supply unit connected to the slit nozzle to supply the photoresist to the slit nozzle.

Growing community of inventors

Gyeongsangbuk-do, South Korea

Jeong-Kweon Park