Samsung Electronics Co., Ltd.

Semes Co., Ltd.

Jeong-Il Mun

Jong-Woo Sun

Hyung-Joo Lee

Dong-Kyu Kim

Jong-Hwan An

Kyeong-Hun Kim

Ja-Myung Gu

Jae-Woong Hwang

Provided is a plasma monitoring apparatus including an objective lens configured to collect light that is emitted from plasma and passes through an optical window of a chamber, a beam splitter configured to divide the light collected by the objective lens into first light and second light, a first optical system and a second optical system that are provided on a first optical path of the first light and a second optical path of the second light, respectively, the first optical system and the second optical system having different focal lengths such that focal points of the first optical system and the second optical system are set at different regions in the plasma, and a light detector configured to detect the first light that has passed through the first optical system and the second light that has passed through the second optical system.

Plasma monitoring apparatus and plasma processing system

A calibrator of an OES may include a cover, a reference light source and a controller. The cover may be detachably combined with a ceiling of a plasma chamber of a plasma processing apparatus. The reference light source may be installed at the cover to irradiate a reference light to the OES through an inner space of the plasma chamber. The controller may compare a spectrum of the reference light inputted into the OES with a spectrum of an actual light inputted into the OES during a plasma process in the plasma chamber to calibrate the OES. Thus, the OES may be calibrated without disassembling of the OES from the plasma chamber to decrease a time for calibrating the OES.

Calibrator of an optical emission spectroscopy

Growing community of inventors

Hwaseong-si, South Korea

Jeong-Il Mun