Samsung Electronics Co., Ltd.

Jeong Hyoun Sung

Youn Sik Choi

Jang Hwan Kim

Young Doo Yoon

Sang Yoon Soh

An electrostatic chuck assembly includes a reference temperature sensor, a measurement zone temperature sensor, and a measurement zone temperature calculator. The reference temperature sensor measures a reference temperature of the electrostatic chuck. The measurement zone temperature sensor is spaced from the reference temperature sensor on the electrostatic chuck and senses temperature signals of a plurality measurement zones of the electrostatic chuck. The measurement zone temperature calculator calculates a temperature of each of the measurement zones by setting a measurement range within a temperature range, previously determined based on the reference temperature measured by the reference temperature sensor, and measures the temperature signal of each of the measurement zones sensed by the measurement zone temperature sensor within the measurement range.

Electrostatic chuck assembly, semiconductor manufacturing apparatus having the same, and method of measuring temperature of electrostatic chuck

A sensorless control apparatus of a motor may include: a position estimator configured to compensate for a resistance and a magnetic flux of a permanent magnet of the motor according to a temperature of the motor, and/or configured to generate an estimated speed of a rotor of the motor based on the compensated resistance and the compensated magnetic flux of the permanent magnet; and/or a speed controller configured to generate a command current based on a command speed of the rotor and the estimated speed of the rotor.

Sensorless control apparatuses of motors and control methods thereof

Disclosed herein is a mask-less exposure apparatus to enlarge or reduce an exposure area in a scan direction and a control method thereof. The mask-less exposure apparatus includes a light source unit configured to supply light, a spatial light modulation unit configured to selectively transmit the light to a substrate, a drive pulse generation unit configured to generate a drive pulse signal and adjust an operation beginning time of the spatial light modulation unit, a substrate shape measurement unit configured to measure a scan-direction length of the substrate, and a drive pulse correction unit configured to correct a drive pulse signal interval so as to enlarge or reduce an exposure area of the substrate according to the scan-direction length of the substrate.

Maskless exposure apparatus and control method thereof

Disclosed herein is a method of compensating for distortion of an exposure pattern due to stage yawing in a maskless exposure apparatus using digital micromirror devices (DMDs). Requirements as to control performance of the stage yawing through the adjustment of sync signals (PEGs) to switch frames of the DMDs are eliminated, thereby reducing manufacturing costs of a large-sized stage. Also, distortion of an exposure pattern, which may occur due to uncompensated yawing, is digitally compensated by controlling the stage yawing, thereby achieving high-quality exposure.

Maskless exposure apparatus and pattern compensation method using the same

Example embodiments are directed to a maskless exposure apparatus to efficiently process frame data of a Digital Micro-mirror Device (DMD) and a frame data processing method thereof. The frame data includes data obtained when a reference pixel of a virtual mask of the DMD and subsequent pixels of the virtual mask of the DMD, each of said subsequent pixels having an exposure time succeeding an exposure time of the reference pixel, are located on the same line. The generated frame data is selectively time-delayed and is changed to exposure frame data, and a pattern is exposed on a substrate using the exposure frame data.

Growing community of inventors

Suwon-si, South Korea

Jeong Hyoun Sung