Beijing Boe Optoelectronics Technology Co., Ltd.

Boe Technology Group Co., Ltd.

Beijing Boe Display Technology Co., Ltd.

Hefei Boe Display Technology Co., Ltd.

Jeong Hun Rhee

Zuhong Liu

Jae Yun Jung

Wei Li

Hongxi Xiao

Taek Ho Hong

Liping Luo

Zhi Hou

Kiyong Kim

Youngjin Song

Chaoqin Xu

Yunyou Zheng

Maomao Fang

Shifei Shen

Jianxin Hou

Lianhua Che

Embodiments of the present disclosure disclose a thin film transistor, a fabrication method thereof, a repair method thereof, and an array substrate. The thin film transistor comprises a gate electrode (), a gate insulating layer (), an active layer (), a source electrode () and a drain electrode (). The source electrode () comprises a first source electrode portion () and a second source electrode portion () independent from each other, the first source electrode portion () and the second source electrode portion () are electrically connected with the active layer (), respectively; and/or, the drain electrode () comprises a first drain electrode portion () and a second drain electrode portion () independent from each other, the first drain electrode portion () and the second drain electrode portion () are electrically connected with the active layer (), respectively.

Thin film transistor, fabrication method thereof, repair method thereof and array substrate

Disclosed is a method for manufacturing an array substrate, the array substrate and a display device which can reduce manufacturing steps of a color filter process and further reduce manufacturing steps of the display device, thereby saving manufacturing cost and time. The method for manufacturing the array substrate includes: forming a thin film transistor on a base substrate; forming a passivation layer having a via hole on a front side of the thin film transistor and forming a photo spacer on a front side of the passivation layer through a halftone mask patterning process. With this method for manufacturing the array substrate, there is no need to prepare the photo spacer on a back side of the color filter substrate. Therefore, it is possible to reduce manufacturing steps of a color filter process, which in turn further reduces manufacturing steps of the display device, thereby saving manufacturing cost and time.

Method for manufacturing array substrate, array substrate and display device

An embodiment of the invention relates to a TFT-LCD array substrate comprising a substrate, a gate line and a data line formed on the substrate, a pixel electrode and a thin film transistor formed in a pixel region defined by the gate line and the data line, wherein the thin film transistor comprises a gate electrode, a source electrode, and a transparent drain electrode, and the transparent drain electrode is electrically connected with the pixel electrode.

TFT-LCD array substrate and manufacturing method thereof

A thin-film transistor (TFT) comprises a gate electrode, a gate insulating layer, a source electrode and a drain electrode which are formed on a base substrate, the source electrode and the drain electrode are disposed on different layers and isolated from each other through a semiconductor connecting section made of an oxide semiconductor material; a position of the semiconductor connecting section corresponds to a position of the gate electrode; and at least one part of the source electrode and at least one part of the drain electrode overlap each other at a position corresponding to the semiconductor connecting section. A display device comprising the TFT and a display device comprising the display device are also disclosed.

Thin film transistor, display device and manufacturing thereof, display apparatus

A Thin Film Transistor-Liquid Crystal Display (TFT-LCD) array substrate is presented which includes a gate line, a data line, and a pixel electrode. The pixel electrode is disposed in a pixel region defined by the intersection between the gate line and the data line. In the pixel region, a partition groove for forming a pixel electrode pattern is provided at the periphery of the pixel electrode.

TFT-LCD array substrate

A TFT-LCD array substrate and a manufacturing method thereof. The array substrate comprises a gate line, a data line, and a pixel electrode, and the pixel electrode is disposed in a pixel region defined by the intersection between the gate line and the data line. In the pixel region, a partition groove for forming a pixel electrode pattern is provided at the periphery of the pixel electrode. This structure is helpful to form a pixel electrode pattern by a lift-off process, which significantly reduces the production cost and improves the production yield.

A method of forming a photoresist burr edge and a method of manufacturing an array substrate are provided in the present invention. The method of manufacturing an array substrate comprises: forming a gate line and a gate electrode on a substrate; forming a data line, a source electrode, a drain electrode and a TFT channel region without removing the photoresist on the data line, the source electrode and the drain electrode; depositing a passivation layer; removing the remained photoresist and the passivation layer thereon by a lifting-off process; applying a photoresist layer; forming a photoresist burr edge of peak shape; depositing a transparent conductive film; forming a pixel electrode by a lifting-off process, wherein the pixel electrode is directly connected with the drain electrode.

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Beijing, China

Jeong Hun Rhee