Jusung Engineering Co., Ltd.

Jeong-Hoon Han

Young-Rok Kim

Jin-Hyuk Yoo

A method of filling a gap on a substrate comprises disposing the substrate, on which the gap is formed, on a susceptor in a chamber; applying a source power to the chamber to generate plasmas into the chamber; supplying a process gas into the chamber; filling a thin film into a gap by applying a first bias power to the susceptor, an amplitude of the first bias power being periodically modulated; stopping supply of the process gas and cutting off the first bias power; and extinguish the plasmas in the chamber.

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Gyeonggi-do, South Korea

Jeong-Hoon Han