Samsung Electronics Co., Ltd.

Jeong-Gil Kim

In Ho Choi

Sung Ho Jang

In Jae Lee

Jinyong Kim

Sungho Jang

Seungkoo Lee

Hyuck Shin

Dong-Hyub Lee

Kyungsik Kang

Yoojin Jeong

Youngduk Suh

Min Seok Choi

Yozo Matsuda

Hochul Kim

An extreme ultraviolet (EUV) collector inspection apparatus and method capable of precisely inspecting a contamination state of an EUV collector and EUV reflectance in accordance with the contamination state are provided. The EUV collector inspection apparatus includes a light source arranged in front of an EUV collector to be inspected and configured to output light in a visible light (VIS) band from UV rays, an optical device configured to output narrowband light from the light, and a camera configured to perform imaging from an UV band to a VIS band. An image by wavelength of the EUV collector is obtained by using the optical device and the camera and a contamination state of the EUV collector is inspected.

Extreme ultraviolet (EUV) collector inspection apparatus and method

An extreme ultraviolet generation apparatus is provided. The extreme ultraviolet generation apparatus includes a chamber, a droplet generator configured to provide a droplet into the chamber, a shroud which extends along a movement path of the droplet inside the chamber and surrounds the movement path of the droplet, a charging unit configured to charge the droplet, a monitoring unit configured to measure a position of the charged droplet, an alignment unit including at least one electromagnet, the alignment unit configured to correct the position of the charged droplet within the shroud using the at least one electromagnet, and an acceleration unit configured to accelerate the charged droplet after the position of the charged droplet has been corrected.

Extreme ultraviolet generation apparatus

Growing community of inventors

Hwaseong-si, South Korea

Jeong-Gil Kim