Sk Innovation Co., Ltd.

Sk Geo Centric Co., Ltd.

Sk Global Chemical Co., Ltd.

Jeong Eop Choi

Hee Jung Jeon

Do Kyoung Kim

Seung Woo Lee

Hee Soo Kim

Ho Won Lee

Yoon Kyung Lee

Jae Suk Choi

Young Moo Park

Ok Youn Kim

Ka Young Kim

Min Ho Jung

Hye Ryoung Lee

Provided is a technology of converting an oil having a high content of Cl into a solvent. Impurities such as Cl, S, N, and metals are removed from an oil having a boiling point of 180 to 340° C. in a waste oil having a high content of Cl, and hydroisomerization is carried out, thereby applying an oil having a high isoparaffin ratio as a solvent. After a separation by boiling points according to the properties of the solvent product, a solid acid material and an oil having a high Cl content are mixed, impurities are removed by a heat treatment at a high temperature, and hydroisomerization is carried out by a noble metal/1-D zeolite catalyst, thereby, manufacturing a solvent product.

Solvent composition prepared from waste oil and method of preparing the same

Provided is a technology to convert an oil having a high content of Cl into a solvent. Impurities such as Cl, S, N, and metals are removed from an oil having a boiling point of 340&#xb0; C. or lower in a waste oil having a high content of Cl, and hydrogenation is carried out to recover an oil, and the oil may be applied as a solvent. Separation by boiling points to meet the properties of the solvent product is performed, a solid acid material and an oil having a high Cl content are mixed, impurities are removed by a heat treatment at a high temperature, and hydrogenation is carried out with a metal oxide catalyst, thereby manufacturing a solvent product.

Provided are a polymer for an underlayer film, used in semiconductor and display manufacturing processes, an underlayer film composition for semiconductor and display manufacturing processes, containing the same, and a method for forming an underlayer film for semiconductor and display manufacturing processes using the underlayer film composition. The polymer according to the present invention is a polymer including a repeating unit represented by the following Chemical Formula 1: in Chemical Formula 1, Ar, Rto R, L, and R' and R&#x2033; are the same as those in the detailed description of the present invention.

Polymer with a good heat resistance and storage stability, underlayer film composition containing the polymer and process for forming underlayer film using the composition

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Daejeon, South Korea

Jeong Eop Choi