Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Jens Ullmann

Christoph Zaczek

Hans-Jochen Paul

Matthias Heller

Harry Bauer

Patrick Scheible

Toralf Gruner

Hubert Holderer

Bernhard Gellrich

Ulrich Weber

Alexander Kohl

Alexandra Pazidis

Martin Weiser

Stefan Wiesner

Michael Thier

Hartmut Muenker

Annette Muehlpfordt

Christoph Zazcek

Jens Luedecke

Birgit Kürz

Christian Wagner

An optical component and a coating system for coating substrates for optical components with essentially rotationally symmetric coatings, the system having a planetary-drive system () that has a rotating planet carrier () and several planets (), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks () that allow controlling the radial variation in physical film thickness is arranged between a source () of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (&#x3b2; max) for every substrate also corotate with the primary carrier (), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.

Optical component and coating system for coating substrates for optical components

A method for coating substrates () for optical components with essentially rotationally symmetric coatings employs a coating system equipped with a planetary-drive system () that has a rotating planet carrier () and several planets (), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks () that allow controlling the radial variation in physical film thickness is arranged between a source () of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (&#x3b2; max) for every substrate also corotate with the primary carrier (), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.

Method and coating system for coating substrates for optical components

A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90&#xb0;, to one another. The two deflecting mirrors are arranged with their reflecting surfaces on a common base member whose position in the objective can be set.

Catadioptric objective

A method and a device for decontaminating optical surfaces, in particular for decontaminating the surfaces of beam-guiding optics employing UV-radiation in a cleansing atmosphere. The wavelength of the UV-radiation employed falls within a range where oxygen strongly absorbs and the cleansing atmosphere has an oxygen concentration less than that of air. The method and device have application to, e.g., cleaning the surfaces of the beam-guiding optics of microlithographic projection-exposure systems.

Method and device for decontaminating optical surfaces

Growing community of inventors

Oberkochen, Germany

Jens Ullmann