Asml Netherlands B.v.

Jens Staecker

Alexander Ypma

Emil Peter Schmitt-Weaver

Daan Maurits Slotboom

Paul Frank Luehrmann

Thomas Leo Maria Hoogenboom

Wolfgang Henke

Pavel Izikson

A lithography system configured to apply a pattern to a substrate, the system including a lithography apparatus configured to expose a layer of the substrate according to the pattern, and a machine learning controller configured to control the lithography system to optimize a property of the pattern, the machine learning controller configured to be trained on the basis of a property measured by a metrology unit configured to measure the property of the exposed pattern in the layer and/or a property associated with exposing the pattern onto the substrate, and to correct lithography system drift by adjusting one or more selected from: the lithography apparatus, a track unit configured to apply the layer on the substrate for lithographic exposure, and/or a control unit configured to control an automatic substrate flow among the track unit, the lithography apparatus, and the metrology unit.

Lithography system and a machine learning controller for such a lithography system

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Veldhoven, Netherlands

Jens Staecker