Carl Zeiss Smt Gmbh

Tooz Technologies Gmbh

Jens Prochnau

Dirk Schaffer

Marwène Nefzi

Joerg Puetz

Bernhard Gellrich

Ralf Zweering

Michael Erath

Viktor Kulitzki

Wolfgang Singer

Jens Kugler

Stefan Xalter

Ralf Meschenmoser

Andreas Wurmbrand

Steffen Fritzsche

Axel Lorenz

Hendrik Wagner

Jörg Pütz

Stefan Schaff

Florian Ahles

Markus Kern

Roman Orlik

Charles Seviour

The disclosure relates to a device for mounting two spherical optical components. The device includes a first holder, having a receptacle for a first optical element with a first spherical convex face with a first radius, and a second holder, having a receptacle for a second optical element with a second spherical optical concave face with a second radius. At least one of the holders has a supporting face with a third radius, and the first holder can be supported on the second holder such that the radii have a common center point when the first optical element is held in the first holder and the second optical element is held in the second holder.

Device for mounting spherical optical components

An optical component has a small-volume section and a large-volume section, wherein said optical component is a single-piece injection-molded component with the exception of one region in the large-volume section, said component being supplemented, in the region in the large-volume section, by an add-on to the optical component.

Optical component and method for the production of same

An optical element is configured to guide imaging light in projection lithography. The optical element has a main body and at least one optical surface carried by the main body. At least one compensation weight element, which is attached to the main body, serves for a weight compensation of a figure deformation of the optical surface caused by gravity. This results in an optical element with a small figure deformation at the use location.

Optical element for the beam guidance of imaging light in projection lithography

An optical arrangement, in particular a lithography system, includes: a movable component, in particular a mirror; at least one actuator for moving the component; and at least one stop having a stop face for delimiting the movement of the component. The optical arrangement further includes, on a stop or on a plurality of stops, at least two stop faces for delimiting the movement of the movable component in one and the same movement direction.

Optical arrangement, in particular lithography system

An optical arrangement, for example a lithography system, includes: a first component, in particular a carrying frame; a second component, in particular a mirror, which is movable in relation to the first component; and at least one stop with at least one stop face for limiting the movement of the second component in relation to the first component. The optical arrangement, preferably the stop, can have a fixing device for fixing the second component. The fixing device can have a fixing element that is movable in relation to the stop face of the stop. Further aspects of the device likewise relate to an optical arrangement with a fixing device or with a transport lock.

Optical arrangement, in particular lithography system, with a transport lock

Disclosed is a lens arrangement, in particular a spectacle lens arrangement, having a base lens element, wherein the base lens element has a first surface and wherein the first surface has a first optically effective region, wherein the first surface has an elongate recess and wherein the elongate recess extends adjacent to the first optically effective region and at least partly encompasses the first optically effective region. Moreover, methods for producing a lens arrangement are disclosed.

Lens arrangement, in particular a spectacle glass arrangement and method for producing a lens arrangement

Methods for coating an optical component with a sharp-edged structure and an optical component are provided. In a variant of the method, the sharp-edged structure in the optical component is rounded in that a lacquer that forms a lacquer meniscus is applied to the sharp-edged structure and subsequently solidified, the lacquer meniscus forming the rounding after the lacquer has solidified. After the rounding, a coating is applied to the optical component, the coating being applied at least to the lacquer meniscus.

Optical component and method for coating optical component

A connection arrangement for connecting an optical component of an optical imaging arrangement to a support unit of a support structure includes: a connecting element unit having a support interface end with support interface section; and a component interface end with a component interface section.

Mounting arrangement for an optical imaging arrangement

The present application discloses a component having a movably mounted component element of a projection exposure apparatus and in particular a movement limiting apparatus, and a method for limiting the movement of movable component elements of a component of a projection exposure apparatus.

Moveably mounted component of projection exposure system, as well as device and method for movement limitation for same

An optical arrangement of a microlithographic projection exposure apparatus includes a mirror element having a mirror substrate, and a reflection region formed on a surface of the mirror substrate. The arrangement also includes at least one actuator configured to move the mirror element in at least one degree of freedom, and a mounting element, which acts on the mirror substrate. The mounting element alone holds the mirror element at least approximately in an equilibrium position, such that the at least one actuator is at least approximately free of forces in the equilibrium position.

Optical arrangement of a microlithographic projection exposure apparatus

The disclosure relates to a mirror module, in particular for a microlithographic projection exposure apparatus, including a mirror, which has a mirror body and an optically effective surface. The mirror body has a first material, and a supporting structure for connecting the mirror body to an objective structure. The supporting structure has a second material. The first material and the second material differ in terms of their coefficients of thermal expansion by less than 0.5*10Kin a temperature range around an operating temperature which is reached by the mirror module during operation in the region of the connection of the mirror body to the supporting structure.

Mirror module, in particular for a microlithographic projection exposure appararatus

An optical imaging apparatus includes an optical element support sub-structure and an auxiliary support sub-structure. The optical element support sub-structure is configured to support an optical element and has a first temporary support interface arrangement. The optical element is configured to form part of a group of optical elements of the optical imaging apparatus configured to transfer, in an exposure process using exposure light, an image of a pattern of a mask onto a substrate. The auxiliary support sub-structure is configured to support an auxiliary component and has a second temporary support interface arrangement. The auxiliary component is configured to execute, during the exposure process, an auxiliary function of the exposure process other than transferring the image of the pattern onto the substrate.

Optical imaging arrangement with simplified manufacture

An arrangement for a lithography apparatus has a component and a weight compensating device to compensate for a weight of the component. The weight compensating device includes a first magnetic device and a second magnetic device. The first magnetic device is designed to exert a first magnetic force on the component. The first magnetic force exceeds the weight of the component. The first magnetic force acts counter to the weight of the component. The second magnetic device is designed to exert a second magnetic force on the component. The second magnetic force acts in the direction of the weight of the component. The first magnetic force corresponds to the sum of the second magnetic force and the weight. The second magnetic device is designed to reduce the second magnetic force at the same time and by the same absolute value as the first magnetic force.

Growing community of inventors

Oberkochen, Germany

Jens Prochnau