Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Jens Dirk Moschner

Hilmar Von Campe

Henning Nagel

Agata Lachowicz

Markus Fiedler

Axel Metz

Raimund DRÖSSLER

Yvonne Gassenbauer

The invention relates to a method for producing a solar cell having a substrate made of silicon, which substrate has a silicon oxide layer present on the surface of the substrate and an antireflection layer applied to the silicon oxide layer, which antireflection layer is deposited onto the dielectric passivation layer in a process chamber. According to the invention, in order to achieve a stability of corresponding solar cells or solar cell modules produced therefrom against a potential induced degradation (PID), the dielectric passivation layer is formed from the surface of the substrate in the process chamber by means of a plasma containing an oxidizing gas.

Method for producing a solar cell

Growing community of inventors

Alzenau, Germany

Jens Dirk Moschner