Au Optronics Corporation

Jen-Kuei Lu

Sheng-Ming Huang

Hui-Ku Chang

Sheng-Kai Lin

Chih-Chiang Chen

Ming-Jui Wang

Chia-Hsin Chung

Tsai-Sheng Lo

Wei-Chi Wang

Wei-Syun Wang

Han-Sheng Nian

Yu-Cheng Shih

Shan-Ying Chou

Li-Kai Chia

Cheng-Chan Wang

Te-Kuang Liu

Huang-Kai Shen

Chia-Po Lin

Chih-Sheng Chang

A polarizer substrate includes a substrate, a reflective layer, and a metal pattern layer. The reflective layer is located on the substrate and has a transmission area and a reflective area. The metal pattern layer is located on the reflective layer and the substrate. The metal pattern layer includes a polarizer structure and a microstructure. The polarizer structure includes a plurality of grid lines overlapping the transmission area. A thickness of each of the grid lines is 200 nm to 500 nm, a width of each of the grid lines is 30 nm to 70 nm, and a distance between each adjacent two of the grid lines is 30 nm to 70 nm. The microstructure overlaps the reflective area, and a thickness of the microstructure is 20 nm to 500 nm.

Polarizer substrate and manufacturing method thereof

An active device substrate including a substrate, first metal grid wires, a first transparent conductive layer, a gate insulating layer, a semiconductor layer, a source, and a drain is provided. The first metal grid wires are located on the substrate. The first transparent conductive layer includes a scan line and a gate connected to the scan line. The scan line and/or the gate is directly connected to at least a part of the first metal grid wires. The gate insulating layer is located on the first transparent conductive layer. The semiconductor layer is located on the gate insulating layer and overlapped with the gate. The source and the drain are electrically connected to the semiconductor layer.

Active device substrate and method for manufacturing the same

A polarizer substrate includes a substrate, an organic planarization layer, an inorganic buffer layer, and a plurality of strip-shaped polarizer structures. The organic planarization layer is located on the substrate. The inorganic buffer layer is located on the organic planarization layer. The inorganic buffer layer has a plurality of trenches located on a first surface. The trenches do not penetrate through the inorganic buffer layer. The strip-shaped polarizer structures are located on the first surface of the inorganic buffer layer. Each of the trenches is located between two adjacent polarizer structures. A display panel is also provided.

Polarizer substrate and display panel

A display device includes a liquid crystal display module, a cover lens, and a polarizer structure. The liquid crystal display module has a display area and a non-display area connected to the display area. The liquid crystal display module includes a bezel, a backlight module, and a display panel. The display panel includes a first substrate, a lower polarizer, a second substrate, a liquid crystal layer, and a filter element. The polarizer structure is located between the cover lens and the second substrate. The polarizer structure includes a plurality of grids and a reflective layer. The grids cover the display area. The reflective layer surrounds the grids and covers a sidewall of the display panel and a sidewall of the bezel in a direction perpendicular to the cover lens. A manufacturing method of the polarizer structure is also provided.

Display device and manufacturing method of polarizer structure

An imprint mold and a method for manufacturing the same are provided. The imprint mold includes a plurality of substantially identical or different mold patterns, wherein there isn't any height difference between the mold patterns. The imprint mold manufacturing method includes: disposing a first layer on a substrate; disposing a first hard mask layer on the first layer, wherein the first hard mask layer includes one or more first hollow area; forming a first mold pattern on the first layer by imprinting, wherein the region of the first mold pattern completely overlaps the region of the vertical projection of the first hollow area on the first layer; removing the first hard mask layer; disposing a second hard mask layer on the first layer, wherein the second hard mask layer includes one or more second hollow area, wherein the region of the vertical projection of the second hollow area on the first layer is adjacent to the first mold pattern; forming a second mold pattern on the first layer by imprinting, wherein the region of the second mold pattern completely overlaps the region of the vertical projection of the second hollow area on the first layer; and removing the second hard mask layer.

Imprint mold and method for manufacturing the same

A display panel has a display area and a peripheral area. The peripheral area is located outside the display area. The display panel includes a first substrate, a second substrate, and a display medium layer. The second substrate is located above the first substrate and includes a first polarization layer, a first quarter wave plate (QWP), a reflection layer, and a pixel array. The first polarization layer is located within the display area and the peripheral area and includes a wire-grid polarizer. The first QWP is located within the peripheral area. The reflection layer is located within the peripheral area, in which the first QWP is located between the first polarization layer and the reflection layer. The pixel array is at least located within the display area. The display medium layer is located between the first substrate and the second substrate.

Display panel

A wire grid polarizer and a display panel using the same are provided. The wire grid polarizer includes a substrate, a plurality of wire grids, a plurality of patterned light absorbing layers, and a surface covering layer. The plurality of wire grids are disposed on the substrate, wherein there are a plurality of gaps between every two wire grids. The plurality of patterned light absorbing layers are disposed corresponding to and overlapping the wire grids respectively, wherein every two of the patterned light absorbing layers have one of the gaps. The surface covering layer is disposed on the patterned light absorbing layers and directly contacts the patterned light absorbing layers.

Wire grid polarizer and display panel using the same

A display panel is provided. The display panel includes a first substrate, a second substrate, a sealing frame set, and a third adhesion portion. The first substrate has an inner surface which includes a superposed area and an exposed area on a side of the superposed area. The second substrate is disposed and superposed on the superposed area; the substrates have a space therebetween. The sealing frame set is located between the substrates and disposed along and insides an edge of the superposed area to enclose the space. The sealing frame set includes first and second sealing frames, wherein the first sealing frame connects the substrates and surrounds the superposed area, the second sealing frame surrounds an outer side of the first sealing frame. A third adhesion portion is located between the first and the second substrates, and between the second sealing frame and the exposed area.

Display panel with protective adhesive portion and manufacturing method thereof

A method of curing a seal and a method of manufacturing a liquid crystal display panel by using the same is provided. To cure a seal between a first substrate and a second substrate of a liquid crystal display panel, a beam of ultraviolet light is irradiated at a predetermined angle of incidence calculated according to the law of total internal reflection into the first substrate and the second substrate respectively. The beam of ultraviolet will irradiate the seal without causing any damage to the liquid crystal inside the display panel.

Growing community of inventors

Hsinchu, Taiwan

Jen-Kuei Lu