Headway Technologies, Incorporated

Amperex Technology Limited

Jei Wei Chang

Kevin K Lin

Chaopeng Chen

Kochan Ju

Po-Kang Wang

Mao-Min Chen

Cherng-Chyi Han

Li-Yan Zhu

Chun Liu

Ping Deng

A battery pack has series-parallel connected battery cells. An inrush current limiting circuit has current limiting devices and a current limiting tracking means limits inrush current from shorted battery cells. Each current limiting tracking means is coupled to the current limiting devices such that they limit an inrush current from parallel neighbor battery cells when one battery cell on the column shorts. The current limiting devices are variable buffer resistors with a positive temperature coefficient. The current limiting tracking means are heat sinks that thermally couples the buffer resistors together such that the buffer resistors increase in resistance with a temperature increase caused by current flowing through the buffer resistor associated with the shorted battery cell. Current regulating elements are in series with columns of battery cells for preventing inrush current to the columns of the battery cells.

Series/parallel connection scheme for energy storage devices

A plated magnetic thin film of high saturation magnetization and low coercivity having the general form CoFeM, where M can be Mo, Cr, W, Ni or Rh, which is suitable for use in magnetic recording heads that write on narrow trackwidth, high coercivity media. The plating method that produces the alloy includes four current application processes: direct current, pulsed current, pulse reversed current and conditioned pulse reversed current.

Ultra high saturation moment soft magnetic thin film

A merged read/write magnetic recording head comprises a low magnetic moment first magnetic shield layer over a substrate. A read gap layer with a magnetoresistive head is formed over the first shield layer. A shared pole comprises a low magnetic moment second magnetic shield layer plated on a sputtered seed PLM layer over the read gap layer, a non-magnetic layer plated over the PLM layer and a HMM lower pole layer plated over the second magnetic shield layer. A write gap layer is formed over the first high magnetic moment pole layer of the shared pole. An upper pole comprises a high magnetic moment pole layer over the write gap layer.

Composite shared pole design for magnetoresistive merged heads

A method for forming a plated magnetic thin film of high saturation magnetization and low coercivity having the general form Co Fe M , where M can be Mo, Cr, W, Ni or Rh, which is suitable for use in magnetic recording heads that write on narrow trackwidth, high coercivity media. The plating method includes four current application processes: direct current, pulsed current, pulse reversed current and conditioned pulse reversed current.

Method of manufacturing an ultra high saturation moment soft magnetic thin film

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Cupertino, CA, United States of America

Jei Wei Chang