Advanced Micro Devices Corporation

Spansion Llc.

Jeffrey Sinclair Glick

Minh Van Ngo

Yider Wu

Rinji Sugino

Kuo-Tung Chang

Kuo Tung Chang

Randolph M Fox

Erwin E Grund

Kimberly J Spencer

A method of manufacturing a memory device includes forming a first dielectric layer over a substrate, forming a charge storage element over the first dielectric layer and forming an inter-gate dielectric over the charge storage element. The method also includes depositing a silicon control gate layer over the inter-gate dielectric using a reactant that contains chlorine.

Method for forming a semiconductor layer with improved gap filling properties

Method for forming a semiconducting layer with improved gap filling properties

An improved silicon nitride etch bath system is provided. The improved etch bath system includes a silicon dioxide condensing system formed of a heat exchanger and a secondary filter. The heat exchanger is provided for removing a small portion of phosphoric acid from an etching bath and for cooling of the same. The secondary filter is used for extracting silicon dioxide particles in the small portion of the phosphoric acid and is operatively connected to the heat exchanger before returning the same to the etching bath. In this manner, the concentration of silicon dioxide in the etching bath will be prevented from being saturated.

Silicon nitride etch bath system

A method and system for preventing a source of ultra-purified water from being contaminated with chemicals includes a source of ultra-purified water and a reservoir containing a chemical source. The reservoir has a chemical delivery valve and a chemical outlet pipe coupled to a chemical delivery line for supplying chemicals to a process chamber during a chemical delivery mode of operation. A first controllable inlet valve has its outlet coupled to the chemical delivery line and the source of ultra-purified water for supplying the ultra-purified water from the source of ultra-purified water to the process chamber during a flushing mode of operation. A second controllable inlet valve has an outlet coupled to the inlet of the first controllable inlet valve and an inlet coupled to the source of ultra-purified water. A source of gas under pressure is coupled between the outlet of the second controllable inlet valve and the inlet of said first controllable inlet valve for creating a virtual air gap. As a result, there is prevented the backflow of the chemical source from the reservoir into the source of ultra-purified water causing contamination thereof during the chemical delivery mode of operation.

Isolation and protection system for preventing a source of

A handler attachment device used for loading and unloading of wafer cassettes into and out of a spray processing tool is comprised of a rectangularly-shaped main body member, two U-shaped gripping members, and two L-shaped bracket members all interconnected together. The main body member includes a narrow middle section and opposed first and second end sections having angled mounting areas disposed therein. The two U-shaped gripping members are mounted to the corresponding first and second mounting areas on the body member. The two L-shaped bracket members are mounted to opposed side edges of the body member for engaging with the wafer cassette. The U-shaped gripping members are grasped by the corresponding hands of an operator in a manner so as to reduce and minimize fatigue and stress to his hands, wrists and arms.

Device for lifting wafer cassettes from a spraying tool

A method and apparatus for wetting, flushing and performing integrity checks on encapsulated PTFE filters includes an integral filter housing (112) encapsulating a PTFE filter (114) therein. The filter housing has an inlet pipe (116), a filter outlet pipe (118), and a vent pipe (122). First controllable inlet valve (126) is coupled to the inlet pipe of the filter housing for supplying a solvent solution to pre-wet the encapsulated PTFE filter. A second controllable inlet valve (117) is also coupled to the inlet pipe of the filter housing for supplying gas from a source under pressure to check the integrity of the pre-wetted PTFE filter. A third controllable inlet valve (119) is also coupled to the inlet pipe of the filter housing for supplying a source of water to flush the pre-wetted filter after checking its integrity.

Growing community of inventors

Cupertino, CA, United States of America

Jeffrey Sinclair Glick