University of Central Florida Research Foundation, Inc.

Jeffrey S Hartlove

Steven W Fornaca

Henry Shields

Mark E Michaelian

Samuel Talmadge

Richard H Moyer

Armando Martos

Stuart J McNaught

Fernando Martos

An EUV radiation source that employs a low energy laser pre-pulse and a high energy laser main pulse. The pre-pulse generates a weak plasma in the target area that improves laser absorption of the main laser pulse to improve EUV radiation emissions. High energy ion flux is reduced by collisions in the localized target vapor cloud generated by the pre-pulse. Also, the low energy pre-pulse arrives at the target area 20&#x2013;200 ns before the main pulse for maximum output intensity. The timing between the pre-pulse and the main pulse can be reduced below 160 ns to provide a lower intensity of the EUV radiation. In one embodiment, the pre-pulse is split from the main pulse by a suitable beam splitter having the proper beam intensity ratio, and the main pulse is delayed to arrive at the target area after the pre-pulse.

Laser-produced plasma EUV light source with pre-pulse enhancement

An EUV radiation source () that includes a nozzle () positioned a far enough distance away from a target region () so that EUV radiation () generated at the target region () by a laser beam () impinging a target stream () emitted from the nozzle () is not significantly absorbed by target vapor proximate the nozzle (). Also, the EUV radiation () does not significantly erode the nozzle () and contaminate source optics (). In one embodiment, the nozzle () is more than 10 cm away from the target region ().

Laser-produced plasma EUV light source with isolated plasma

Growing community of inventors

Rolling Hills Estates, CA, United States of America

Jeffrey S Hartlove