Semiconductor Components Industries, LLC

Jeffrey Mackey

Brian A Vaartstra

Gershon Rosenblum

Alexandre G Dokoutchaev

Ulrich C Boettiger

Gennadiy A Agranov

Richard D Holscher

Brian W Keelan

Loriston Ford

Mattia Cichocki

Mitchell J Mooney

Rick Holscher

An imaging system may include an image sensor having an array of image pixels. Some image pixels in the array may be provided with spectral response adjustment structures. For example, a plurality of broadband pixels in the array may include spectral response adjustment structures. The spectral response adjustment structures may be configured to narrow the spectral response of the broadband pixels in high light conditions. For example, the spectral response of the broadband pixels may transition from clear to gray, from clear to green, or from yellow to green as the light level increases. The spectral response adjustment structures may, for example, be formed from photochromic materials or electrochromic elements. Processing circuitry in the imaging system may generate a color correction matrix for an image based at least partly on the state of the spectral response adjustment structures.

Imaging systems with image pixels having adjustable spectral responses

An imaging system may include a camera module with an image sensor having an array of image sensor pixels. The image sensor may include a substrate having an array of photodiodes, an array of microlenses formed over the array of photodiodes, and an array of color filter elements interposed between the array of microlenses and the array of photodiodes. A grid of baffles may be formed over the array of image pixels and may be configured to block stray light from striking the image pixels. The baffles may extend above the microlens array and may be tilted at an angle with respect to the optical axis of the image sensor. The angle at which each baffle is tilted may be proportional to the chief ray angle of an associated microlens. Baffles may be formed from a light-blocking material such as metal, photoresist, carbon, graphite, or other suitable material.

Imaging systems with baffle grids

An image sensor may have an array of image sensor pixels arranged in unit pixel cells each having at least one modified clear image pixel. Each modified clear image pixel may include a modified clear color filter element formed from a transparent material such as an oxide material that is modified with a colored pigment or colored dye such as yellow pigment. Each unit pixel cell may include one or more color pixels of other colors such as red pixels, blue pixels, and green pixels. Image signals such as yellow image signals from the modified clear pixels may be processed along with other color image signals such as red image signals and blue image signals to generate standard red, green, and blue image data. Image processing operations may include chroma demosaicing or point filtering of the image signals from the modified clear image pixels.

Imaging systems with modified clear image pixels

An image sensor may have an array of image sensor pixels having varying light collecting areas. The light collecting area of each image pixel may vary with respect to other image pixels due to varied microlens sizes and varied color filter element sizes throughout the array. The light collecting area may vary within unit pixel cells and the variability of the light collecting areas of pixels within each pixel cell may depend on the location of the pixel cell in the pixel array. Each unit pixel cell may include at least one clear pixel having a light collecting area that is smaller than the light collecting areas of other single color pixels in the unit pixel cell.

Imaging systems with image pixels having varying light collecting areas

Pixel arrays are provided for image sensors that have barriers between color filters in an array of color filters. Color filter barriers may be formed from a transparent or semi-transparent material. Color filter barriers may be formed from a low refractive index material. Color filters may be etched and color filter barrier material may be formed in the etched regions of the color filters. If desired, a layer of color filter barrier material may be etched to form open regions and color filter material may be formed in the open regions of the color filter barrier material. An image sensor may be a front-side illuminated image sensor or a back-side illuminated image sensor.

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Danville, CA, United States of America

Jeffrey Mackey