Goldfinger Technologies, LLC

Interuniversitair Microelektronica Centrum (imec)

Akrion Technologies, Inc.

Jeffrey M Lauerhaas

Paul Mertens

Thomas J Nicolosi, Jr

William Fyen

Mario E Bran

Yi Wu

Raoul Standt

Chad M Hosack

Paul Patel

Geert Doumen

An apparatus for drying a generally flat substrate that has been cleaned has a rotatable support for supporting the substrate, a substrate drying assembly, and a controller. The substrate drying assembly includes a substrate drying assembly support arm, an outlet for applying liquid to an upper surface of the substrate, and an outlet for applying a drying vapor to the upper surface of the substrate. The substrate drying assembly is configured to position the liquid applying outlet and to position the vapor applying outlet above a portion of the substrate. The controller causes the substrate drying assembly to be retracted over the upper surface of the substrate at a faster rate near a center of the substrate than near a periphery of the substrate.

Megasonic cleaner and dryer

An apparatus includes a rotatable chuck for supporting a substrate and a splash guard. The splash guard surrounds the chuck and surrounds a substrate mounted on the chuck. The splash guard has a portion that deflects fluid being flung off the substrate by centrifugal action in a manner so as to not splash back onto the substrate. The splash guard is moveable between a process position in which the upper annular edge of the splash guard extends above the chuck and a substrate on the chuck, and a load/unload position in which the splash guard is tilted so that one side of the upper annular edge is below an upper edge of the chuck. The movement of the splash guard facilitates loading and unloading of a substrate.

Megasonic cleaner and dryer system

Growing community of inventors

Leuven, Belgium

Jeffrey M Lauerhaas