USA As Represented by Secretary of the Navy

Shipley Company LLC

Geo-centers, Inc.

Other

Rohm & Haas Electronic Materials LLC

Rohm and Haas Company

Dow Global Technolgoies LLC

University of Pennsylvania

The United States of America

Geo-center, Inc.

Jeffrey M Calvert

Mu-San Chen

Jacque H Georger, Jr

Walter J Dressick

Joel M Schnur

Martin C Peckerar

Ranganathan Shashidhar

Terrence G Vargo

Gary S Calabrese

Denis Morrissey

Charles S Dulcey

Michael K Gallagher

Banahalli R Ratna

Paul E Schoen

Timothy G Adams

Robert D Mikkola

Dana A Gronbeck

Renate J Crawford

Brian M Peek

Michael Gulla

Christie R Marrian

Joseph A Gardella

John F Bohland

Milton L Rebbert

James J Hickman

James G Shelnut

Paul Yager

Kenneth Joseph Wynne

Alan G MacDiarmid

Eugene N Step

Martin William Bayes

Mark Lefebvre

Gregory P Prokopowicz

Ronald R Price

Javad J Sahbari

Matthew Lee Grandbois

Charles R Marston

Leon Barstad

Pehr E Pehrsson

Joseph F Lachowski

Harlan Robert Goltz

Matthew Lawrence Rodgers

David Merricks

Donald E Storjohann

Robert A Binstead

Edward W Rutter, Jr

Susan L Brandow

Robert A Schetty, Iii

Walter M Dressick

Robert A Mikkola

Kirsten A Grueneberg

Linda A Chrisey

Timothy S Koloski

Jamshid K Avlyanov

Matthew L Granbois

Photoresist compositions are provided comprising a radiation sensitive component and at least two distinct novolak resins. In one aspect, photoresists of the invention exhibit notably high dissolution rates, such as in excess of 800 angstroms per second in aqueous developer solution. In another aspect, photoresists of the invention can exhibit good photospeeds, such as 100 mJ/cmor less.

Photoresists comprising novolak resin blends

Methods of purifying acidic metal solutions by removing at least a portion of alpha-particle emitting materials are provided. The purified metal solutions are useful in a variety of applications requiring low levels of alpha-particle emission.

Alpha-particle emitter removal

A method of forming air gaps within a solid structure is provided. In this method, a sacrificial material is covered by an overlayer. The sacrificial material is then removed through the overlayer to leave an air gap. Such air gaps are particularly useful as insulation between metal lines in an electronic device such as an electrical interconnect structure. Structures containing air gaps are also provided.

Electronic devices having air gaps

Air gap formation

Methods for depositing uniform, pinhole-defect free organic polysilica coatings are provided. These methods allow for the use of these materials as spin-on cap layers in the manufacture of integrated circuits.

Electronic device manufacture

Disclosed are methods for repairing seed layers prior to subsequent metallization during the manufacture of electronic devices. Also disclosed are electronic devices containing substantially continuous seed layers.

Seed layer repair

Disclosed are compositions useful for repair and electroplating of seed layers. Also disclosed are methods of repairing and electroplating such seed layers.

Seed repair and electroplating bath

Disclosed are electrolytes for copper electroplating that provide enhanced fill of small features with less overplate. Also disclosed are methods of plating substrates, such as electronic devices, using such electrolytes.

Method of electrodepositing copper

Disclosed is a method of electroplating substrate such that small recessed features are completely filled with minimum thickness of the deposited metal over fields.

Electroplating method

Disclosed is a method of analyzing components in an electroplating bath. Also disclosed is a method of controlling electroplating baths by monitoring the components of the plating bath in real-time.

Electroplating bath control

Disclosed are methods of repairing metal seed layers prior to subsequent metallization. Such repair methods provide metal seed layers disposed on a substrate that are substantially free of metal oxide and substantially free of discontinuities.

Seed layer repair method

An aspect of the present invention is a process for modifying a substrate in areas that are exposed to actinic radiation, having the steps: (a) providing on the substrate functional groups adapted for conversion to oxygen-containing photoproducts upon exposure to actinic radiation; (b) exposing at least a portion of the substrate to the actinic radiation, converting the functional groups in an exposed region of the substrate to the photoproducts; (c) contacting the photoproducts with a primary or secondary amine in the presence of hydrogen ions, forming imine groups; and (d) contacting the imine groups with a reducing agent, forming amine groups on the substrate in the exposed region. Another aspect of the present invention is a process for modifying a substrate in areas that are unexposed to actinic radiation, having the steps: (a) providing on the substrate aryl functional groups adapted for conversion to oxygen-containing photoproducts upon exposure to actinic radiation; (b) exposing a portion of the substrate to the actinic radiation, converting the aryl functional groups in an exposed region of the substrate to the photoproducts, and not converting the aryl functional groups in an unexposed region of the substrate to the photoproducts; (c) contacting the aryl functional groups in the unexposed region of the substrate with a compound adapted for physisorption to the aryl functional groups, preferentially physisorbing the compound onto the substrate in the unexposed regions.

Methods and materials for selective modification of photopatterned polymer films

Methods for and products of modification and metallization of oxidizable surfaces, including diamond surfaces, by plasma oxidation

Disclosed are compositions useful for removing antireflective compositions from a substrate. Also disclosed are methods of removing antireflective compositions from a substrate using such compositions.

Stripping method

A surface for the alignment of liquid crystals containing directionally-linked groups and compounds useful for preparing such surfaces are disclosed.

Liquid crystal composition and alignment layer

Growing community of inventors

Acton, MA, United States of America

Jeffrey M Calvert