Leica Microsystems Lithography Gmbh

Jeffrey Kristoff

Klaus-Dieter Adam

Gerhard Schubert

Nigel Crosland

Brian Rafferty

Timothy Groves

A dual-mode electron beam lithography machine () comprises an electron beam column () for generating an electron beam () for writing a pattern on a surface of a substrate) by way of a writing current, the substrate being supported on a stage () movable to displace the substrate relative to the beam. The column () includes beam deflecting plates () for deflecting the beam to scan the substrate surface in accordance with the pattern to be written and beam blanking plates () for blanking the beam to interrupt writing. The machine further comprises control means (to) for changing each of writing current, stage movement, beam deflection and beam blanking between a predetermined first mode optimised for pattern-writing accuracy, thus resolution, and a predetermined second mode different from the first mode and optimised for pattern-writing speed, thus throughput.

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Hilton Head Island, SC, United States of America

Jeffrey Kristoff