Lumera Corporation

Jeffrey K Kressbach

Raluca Dinu

Louis J Bintz

Dan L Jin

In one aspect, a microelectrode comprising an upper surface, two walls, and a polymer core is described, wherein each of the two walls forms an angle with a lower surface, and the upper surface and each of the two walls comprises a metal thin film in contact with the polymer core. The lower surface, however, lacks a continuous metal thin film. In another aspect, a microelectrode comprising a metal thin film is described in which the metal thin film has a thickness and a plane bisects the thickness. The plane forms an angle with a lower surface that lacks a contiuous metal thin film. The metal thin film is in contact with a supporting polymer having an upper surface that also lacks a continuous metal thin film.

Polymer sustained microelectrodes

A process for fabricating a microelectrode is described that includes: a) providing a substrate comprising at least one polymer micro-ridge, where the polymer micro-ridge comprises an upper surface and two walls, and the two walls form an angle with a lower surface; b) depositing a metal thin film on the upper surface, the two walls, and the lower surface; and c) etching a predetermined amount of the deposited metal thin film on the lower surface to form the microelectrode.

Process of fabricating polymer sustained microelectrodes

A microfabrication process for preparing articles in which a precursor article that includes (a) a substrate, (b) a first polymer layer overlying the substrate, (c) a second polymer layer overlying the first polymer layer, (d) a metal hardmask layer overlying the second polymer layer, and (e) a photodefinable layer overlying the metal hardmask layer is subjected to photolithographic imaging, developing, and plasma etching steps to form an article that includes the substrate and portions of the first polymer layer arranged in a pattern corresponding to the pattern of the photomask used for photolithographic imaging.

Method for manufacturing polymer microstructures and polymer waveguides

A process for fabricating an electro-optic device is decribed that includes: a) providing a substrate comprising at least two polymer micro-ridges, where each polymer micro-ridge comprises an upper surface and two walls, and the two walls form an angle with a lower surface; b) depositing a metal thin film on the upper surface, the two walls, and the lower surface; c) etching a predetermined amount of the deposited metal thin film on the lower surface, thereby forming two electrodes separated by a gap; d) depositing a nonlinear optical polymer in the gap between the two electrodes; and e) poling the nonlinear optical polymer to induce electro-optic activity.

Growing community of inventors

Snohomish, WA, United States of America

Jeffrey K Kressbach