Visx, Inc.

Gennext Technologies, Inc.

Amo Manufacturing Usa, LLC

Jeffrey Jonathan Persoff

Scot Randy Weinberger

Robert W Egan

Ronald Carl Orlando

Joshua Shane Sharp

Dimitri A Chernyak

Kingman Yee

Charles E Campbell

Junzhong Liang

Seema Somani

Charles R Munnerlyn

Brian M Bliven

Brian Bliven

Walter Huff

Robert Wallace Egan

Flash Photo-Oxidation Device and Higher Order Structural Analysis is employed for higher order structural analysis of biomolecules. Biomolecular higher order structure (HOS) results from the confounded superimposition of a biomolecule's secondary, tertiary, and quaternary structure and defines the manner in which a biomolecule presents itself and interacts with other biomolecules in living systems. A rapidly growing class of therapeutic drugs, known as biotherapeutics, comprises a variety of proteins, whose therapeutic properties are inherently linked and dependent upon their HOS. As such, HOS analysis of biotherapeutics is an important analytical requirement in the biopharmaceutical industry. The present invention provides new means and methods for the determination of biopharmaceutical HOS and associated conformation using improved devices and methodologies for flash photo-oxidation of proteins to determine their higher order biomolecular structure, and such is responsive to the increased demand for new and improved HOS analytical means in the biopharmaceutical industry.

Radical dosimetry methods for in vivo hydroxyl radical protein foot-printing

Flash photo-oxidation device and higher order structural analysis

A wavefront sensor enhances calibration of a laser ablation system, such as a laser eye surgery system, by measuring one or more characteristics of an ablated test surface. Typically, light is passed through the ablated test surface, and the light is analyzed to determine the test surface characteristics. In some embodiments, the ablated test surface is positioned along a treatment plane. In some embodiments, light is passed through a wavefront sensor, such as a Hartmann-Shack sensor, to convert the light into electrical signals. A processor then converts the electrical signals into data, such as surface maps showing high-order aberrations and/or artifacts on the test surface, refractive power measurements, shape measurements, and the like. Generated data may then be used to calibrate a laser surgery system.

Wavefront calibration analyzer and methods

Systems and methods orient sensors of an optical system that measures aberrations of an eye. The aberration measurement system may include an optical aberration sensor and an eye image sensor. An asymmetric feature can be imposed in an optical beam path so as to introduce artifacts at the sensors. The optical aberration sensor is often oriented relative to an eye image sensor in response to the asymmetric feature of an optical beam path. In some embodiments, a tool supported by a rail imposes the asymmetric feature on the optical beam path. Aberrations of the eye are measured along the optical beam path with an optical aberration sensor while an eye image sensor forms an image of a tissue structure of the eye positioned along the beam optical path. An aberration correcting shape is identified and ablated in corneal tissue with a laser.

Systems and methods for eye aberration and image sensor orientation

The present invention provides methods and devices for calibrating an optical wavefront system. The calibration devices of the present invention can include a body which has a proximal portion and a distal portion. A pupil can be positioned on the proximal portion of the body to aperture light. A target can be positioned on the distal portion of the body so as to reflect light back through the pupil and into the wavefront system. If the device has a lens assembly or a phase plate, the reflected light can pick up known aberrations or defocus characteristics from the lens assembly before it enters the calibration device. The known wavefront characteristic can be compared to the wavefront measurement obtained by the wavefront system to aid in calibrating the wavefront system.

Method and device for calibrating an optical wavefront system

Apparatus and methods can determine positional and rotational offsets between a first and second imaging device. Embodiments may determine the relative offsets between a Hartmann-Shack wavefront sensor and a pupil camera using a calibration apparatus having a rotationally asymmetric aperture. The image obtained by the Hartmann-Shack wavefront sensor way comprise a spot pattern that corresponds to a shape of the aperture. A marker may be superimposed over the images, with a shape of the marker substantially corresponding to the shape of the aperture, and movements of the marker from nominal positions on each image can be compared to determine the offsets.

Apparatus and method for determining relative positional and rotational offsets between a first and second imaging device

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San Jose, CA, United States of America

Jeffrey Jonathan Persoff