Honeywell International Inc.

Jeffrey J Schaefer

Stephane Ferrasse

Susan D Strothers

Frank C Alford

Suresh Sundarraj

A sputtering target comprising a forged aluminum material having an average grain size between about 15 and 55 microns. The aluminum material has at least one of the following: a homogeneous texture with minimal texture banding as measured by banding factor B below about 0.01; a texture gradient H of less than 0.2; or either weak (200) texture or near random texture characterized by maximum intensity of inverse pole figure less than 3 times random in multiple directions.

Growing community of inventors

Spokane Valley, WA, United States of America

Jeffrey J Schaefer