Motorola Corporation

Freescale Semiconductor,inc.

Jeffrey H Baker

Albert Alec Talin

William J Dauksher

Nicholas David Rizzo

Mark A Durlam

Jaynal Abedin Molla

Gregory W Grynkewich

Brian R Butcher

Kelly Wayne Kyler

Douglas J Resnick

Mark F Deherrera

Steven M Smith

Steven A Voight

Earl D Fuchs

John J D'Urso

J Jack Ren

Andy E Hooper

Paige M Holm

Curtis D Moyer

Kenneth Andrew Dean

Bernard F Coll

Yi Wei

Kevin J Nordquist

Ruth Yu-Ai Zhang

Ngoc V Le

Anthony Polito

Islamshah S Amlani

Diana J Convey

Laura Siragusa

This invention relates to semiconductor devices, microelectronic devices, micro electro mechanical devices, microfluidic devices, photonic devices, and more particularly to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template () is formed having a substrate (), a transparent conductive layer () formed on a surface () of the substrate () by low pressure sputtering to a thickness that allows for preferably 90% transmission of ultraviolet light therethrough, and a patterning layer () formed on a surface () of the transparent conductive layer (). The template () is used in the fabrication of a semiconductor device () for affecting a pattern in device () by positioning the template () in close proximity to semiconductor device () having a radiation sensitive material formed thereon and applying a pressure to cause the radiation sensitive material to flow into the relief image present on the template. Radiation is then applied through the template so as to cure portions of the radiation sensitive material and define the pattern in the radiation sensitive material. The template () is then removed to complete fabrication of semiconductor device ().

Lithographic template and method of formation and use

A method is provided for forming a porous metal catalyst () on a substrate () for nanotube () growth in an emissive display. The method comprises depositing a metal () onto a surface of a substrate () at an angle (&#x398;) to the surface, depositing a metal catalyst () onto the metal (), and forming nanotubes () on the metal catalyst ().

Method of forming a porous metal catalyst on a substrate for nanotube growth

A lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template is provided. The lithographic template () and the method of making comprises forming a transparent conductive layer () over a substrate (). A SiCN layer () is formed over the transparent conductive layer (), and a patterning layer () formed on the SiCN layer (). The SiCN layer () is converted to an SiOlayer by applying an Oplasma (). The SiOlayer prevents damage to the transparent conductive layer () during cleaning and provides a binding mechanism for the imprint release coating.

A method is provided for forming a monolithically integrated optical filter, for example, a Fabry-Perot filter, over a substrate (). The method comprises forming a first mirror () over the substrate (). A plurality of etalon material layers () are formed over the mirror (), and a plurality of etch stop layers () are formed, one each between adjacent etalon material layers (). A photoresist is patterned to create an opening () over the top etalon material layer () and an etch () is performed down to the top etch stop layer (). An oxygen plasma () may be applied to convert the etch stop layer () within the opening () to silicon dioxide (). The photoresist patterning, etching, and applying of an oxygen plasma may be repeated as desired to obtain the desired number of levels (). A second mirror () is then formed on each of the levels ().

Integrated multi-wavelength Fabry-Perot filter and method of fabrication

A method for fabricating a cladded conductor () for use in a magnetoelectronics device is provided. The method includes providing a substrate () and forming a conductive barrier layer () overlying the substrate (). A dielectric layer () is formed overlying the conductive barrier layer () and a conducting line () is formed within a portion of the dielectric layer (). The dielectric layer () is removed and a flux concentrator () is formed overlying the conducting line ().

Cladded conductor for use in a magnetoelectronics device and method for fabricating the same

A method of fabricating a nanotube structure which includes providing a substrate, depositing a supporting layer and an active catalyst film layer onto the substrate, and forming at least one nanotube on the surface of the substrate using a reaction chamber having a growth temperature of less than 850&deg; C.

Method for chemical vapor deposition of single walled carbon nanotubes

A field emission device ( ) includes a substrate ( ), a cathode ( ) formed thereon, a plurality of electron emitters ( ) and a plurality of gate electrodes ( ) proximately disposed to the plurality of electron emitters ( ) for effecting electron emission therefrom, a dielectric layer ( ) having a major surface ( ), a surface passivation layer ( ) formed on the major surface ( ), and an anode ( ) spaced from the gate electrodes ( ).

Field emission device having a surface passivation layer

A method for fabricating an array of conical electron emitters (410) includes the steps of: (i) positioning a collimator (160), including a plurality of collimation cells (162) having hexagonal cross-sections, between a substrate (155) having emitter wells (130) and a target (170) made from the emitter material, (ii) sputtering the target (170) so that it is partially collimated by the collimator (160), (iii) moving the substrate (155) within a plane defined by the substrate (155) so that the emitter wells (130) follow an emitter well path (220) which forms a 15.degree. path angle (235) with respect to a reference line (240) of the collimator (160).

Method for fabricating an array of conical electron emitters

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Chandler, AZ, United States of America

Jeffrey H Baker