Advanced Technology Materials, Inc.

Sonata Scientific LLC

Other

Entegris, Inc.

International Business Machines Corporation

Lucent Technologies Inc.

Jeffrey F Roeder

Thomas H Baum

Bryan Clark Hendrix

Chongying Xu

Peter C Van Buskirk

Tianniu Chen

Steven M Bilodeau

Ziyun Wang

Philip S H Chen

William Hunks

Matthias Stender

Gregory T Stauf

Frank S Hintermaier

Debra A Desrochers

Melissa A Petruska

Ing-Shin Barry Chen

James J Welch

Mackenzie E King

Daniel J Vestyck

Frank DiMeo, Jr

Thomas M Cameron

Michael W Russell

Jeffrey W Neuner

Stephen T Johnston

Trevor E James

Ravi Kumar Laxman

Weimin Li

Henry Atkinson Nye, Iii

Christine Dehm

Wolfgang Hoenlein

Michele Stawasz

Anthony F Zeberoff

Ho-Ming Tong

Karl E Boggs

Paul A Totta

Jun Liu

Michael S Darsillo

Witold Paw

Robert T Henderson, Iii

Debra Desrochers Christos

Adrien Lavoie

Christopher Vincent Jahnes

Madhav Datta

Harsono S Simka

Jun-Fei Zheng

Juan E Dominguez

Scott L Battle

Birendra N Agarwala

Kevin Huang

Alexander S Borovik

Peter Wrschka

Roderick Kent Watts

Henry Miles O'Bryan

Michael A Russak

Philip S Chen

Richard E Gegenwarth

Matthew Healy

Debra A Desrochers-Christos

Abigail Ebbing

Michele Stawacz

Patrick M Miller

Thomas S Spoonmore

Thomas J Spoonmore

James D Carruthers

Maryam Golalikhani

The Invention describes LED illuminated photocatalytic fluid purification systems, especially for use for ethylene mitigation and control in agricultural, horticultural and floricultural growth, storage and transport modules. Aspects of the invention include systems integration with grow lights, ethylene and plant stress sensors, and communication with external control and data sources.

Photocatalytic fluid purification systems

Monolithic composite photocatalysts for fluid purification are disclosed. The monolithic composite photocatalysts comprise a photoactive nanocrystal component and a non-photoactive porous support. Photocatalytic fluid purification systems that contact an impurity-containing fluid with the subject monolithic composite photocatalysts are also disclosed. The monolithic composite photocatalysts may be affixed to or embedded in scaffold structures to promote fluid flow through a fluid purification system and contact with the monolithic composite photocatalysts.

Monolithic composite photocatalysts

Polymer coatings and surfaces are disclosed with antimicrobial properties. The antimicrobial action is provided by high surface area materials contained within the coating or surface. The high surface area materials may contain photocatalysts that create reactive oxygen species upon exposure to visible light or transition metals that create reactive oxygen species upon exposure to hydrogen peroxide. The high surface area materials may also sorb disinfecting liquids and desorb them over time to provide disinfection.

Antimicrobial surface systems

Fluid purification systems employing a monolithic composite photocatalyst to remove volatile organic compounds (VOCs) and/or pathogenic organisms are disclosed. Pairing of systems tuned to abate each of these materials are discussed in different configurations such as series and parallel, as well as combining systems to target both materials simultaneously. System configurations that allow a portion of the fluid stream to be purified are also disclosed as are configurations that allow regeneration of the photocatalyst. These features may be augmented by sensors that allow closed loop control of bypass and regeneration cycles in the systems.

Combined VOC mitigating and antimicrobial systems

The Invention describes photocatalytic reactor systems that employ fluidization of the photocatalyst. These systems are useful for performing chemical transformations on a chemical containing fluid, including for VOCs. Aspects of the invention include non-imaging optics, abrasion resistant coatings and photoreactor designs.

Photocatalytic fluidized bed reactor systems

Monolithic composite photocatalysts for fluid purification, chemical transformations, and surface sterilization are disclosed. The monolithic composite photocatalysts comprise a photoactive nanocrystal component and a non-photoactive porous support. Photocatalytic fluid purification systems that contact an impurity-containing fluid with the subject monolithic composite photocatalysts are also disclosed.

The Invention describes integration of photocatalytic materials into composite surfaces in order to achieve antimicrobial properties. Aspects of the invention include types of photocatalytic materials and methods to achieve long lifetimes, high durability and mechanical robustness, for application to medical and sanitary uses, among others. In particular, the invention describes production of photocatalytic islands on a porous support substrate, and various methods to prevent full contact of a matrix material with the photocatalytic islands on the porous support substrate when forming the photocatalytic composite. Reducing the area of contact between the matrix material and the photocatalytic material improves the lifetime of the photocatalytic materials employed in the photocatalytic composite.

Photocatalytic surface systems

A novel method to produce ALD films disposed on powders is disclosed. Examples include the formation of a cobalt doped zirconia (CDZ), hafnia, and cobalt doped hafnia (CDH) films on lanthanum strontium cobalt iron oxide (LSCF) powder for solid oxide fuel cell cathodes. The coated powders are sintered into porous cathodes that have utility for preventing the migration of cations in the powder to the surface of the sintered cathode and/or other performance enhancing attributes.

Dual conductor surface modified SOFC cathode particles and methods of making same

A novel method to produce thin films spatially disposed on desired areas of workpieces is disclosed. Examples of include the formation of a yttria stabilized zirconia (YSZ) film formed on a desired portion of a stainless steel interconnect for solid oxide fuel cells by Atomic Layer Deposition (ALD). A number of methods to produce the spatially disposed YSZ film structures are described including polymeric and silicone rubber masks. The thin film structures have utility for preventing the reaction of glasses with metals, in particular alkali-earth containing glasses with ferritic stainless steels, allowing high temperature bonding of these materials.

SOFC interconnect barriers and methods of making same using masks

An apparatus and method is described to coat small and large quantities of solid particles using atomic layer deposition, with increased material utilization and decreased cycle times. The resulting higher coating efficiency ALD process is achieved by a controlled pressure differential acting across a rotating porous vessel that contains a plurality of solid particles. The apparatus is comprised of two coaxial cylindrical porous vessels with a means for one to rotate, and a two stage rotary feedthrough with a specialized hollowed out shaft, which enables both rotation of the vessel and reactant, purge, and product gas transport across a particle bed that undergoes mixing.

Apparatus and method for coating bulk quantities of solid particles

A novel method to modify the surface of lanthanum and strontium containing cathode powders before or after sintering by depositing layers of gadolinium doped ceria (GDC) and/or samarium doped ceria or similar materials via atomic layer deposition on the powders. The surface modified powders are sintered into porous cathodes that have utility enhancing the electrochemical performance of the cathodes, particularly for use in solid oxide fuel cells. Similar enhancements are observed for surface treatment of sintered cathodes.

Surface modified SOFC cathode particles and methods of making same

SOFC interconnect barriers and methods of making same

A full fill trench structure is described, including a microelectronic device substrate having a high aspect ratio trench therein and filled with silicon dioxide of a substantially void-free character and substantially uniform density throughout its bulk mass. A method of manufacturing a semiconductor product also is described, involving use of specific silicon precursor compositions for forming substantially void-free and substantially uniform density silicon dioxide material in the trench. The precursor fill composition may include silicon and germanium, to produce a microelectronic device structure including a GeO/SiOtrench fill material. A suppressor component may be employed in the precursor fill composition, to eliminate or minimize seam formation in the cured trench fill material.

Precursors for silicon dioxide gap fill

Silicon precursors for forming silicon-containing films in the manufacture of semiconductor devices, such as films including silicon carbonitride, silicon oxycarbonitride, and silicon nitride (SiN), and a method of depositing the silicon precursors on substrates using low temperature (e.g., &#x3c;550&#xb0; C.) chemical vapor deposition processes, for fabrication of ULSI devices and device structures.

Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films

Barium, strontium, tantalum and lanthanum precursor compositions useful for atomic layer deposition (ALD) and chemical vapor deposition (CVD) of titanate thin films. The precursors have the formula M(Cp), wherein M is strontium, barium, tantalum or lanthanum, and Cp is cyclopentadienyl, of the formula wherein each of R-Ris the same as or different from one another, with each being independently selected from among hydrogen, C-Calkyl, C-Camino, C-Caryl, C-Calkoxy, C-Calkylsilyl, C-Calkenyl, RRRNNR, wherein R, Rand Rmay be the same as or different from one another and each is independently selected from hydrogen and C-Calkyl, and pendant ligands including functional group(s) providing further coordination to the metal center M. The precursors of the above formula are useful to achieve uniform coating of high dielectric constant materials in the manufacture of flash memory and other microelectronic devices.

Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films

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Brookfield, CT, United States of America

Jeffrey F Roeder