Carl Zeiss Smt Gmbh

Carl Zeiss Laser Optics Gmbh

Jeffrey Erxmeyer

Johannes Kraus

Michael Schall

Vitaliy Shklover

Horst Feldermann

Ulrich Weber

Holger Muenz

Bernd Kleemann

Markus Bauer

Willi Anderl

Ralf Kuschnereit

Michel Le Maire

Konstantin Forcht

Ingrid Schuster

Oliver Gloeckl

Stefan Weissenrieder

Ute Heinemeyer

Alexandra Pazidis

Martin Hermann

Conrad Wolke

Nils Lundt

An optical component comprises a first layer system exhibiting a first wavelength-dependent reflectivity curve when electromagnetic radiation impinges thereon, and at least one second layer system exhibiting a second wavelength-dependent reflectivity curve when electromagnetic radiation impinges thereon. The first layer system and the second layer system are arranged on different optical surfaces. The wavelength dependencies of the first and the second reflectivity curve at least partially compensate one another so that the relative deviation from a desired reflectivity curve which is linear or constant with respect to the wavelength is no more than 5% within the specified wavelength range for a resultant summated reflectivity for the first layer system and the at least one second layer system. An optical system, such as a microlithography projection exposure apparatus, can include such an optical component.

Optical component and optical system, in particular for microlithography

In situ dynamic protection of an optical element surface against degradation includes disposing the optical element in an interior of an optical assembly for the FUV/VUV wavelength range and supplying at least one volatile fluorine-containing compound (A, B) to the interior for dynamic deposition of a fluorine-containing protective layer on the surface. The protective layer () is deposited on the surface layer by layer via a molecular layer deposition process. The compound includes a fluorine-containing reactant (A) supplied to the interior in a pulsed manner. A further reactant (B) is supplied to the interior also in a pulsed manner. An associated optical assembly includes an interior in which a surface is disposed, and at least one metering apparatus () that supplies a reactant to the interior. The metering apparatus provides a pulsed supply of the compound as a reactant (A, B) for layer by layer molecular layer deposition.

Method for in-situ dynamic protection of a surface and optical assembly

A beam reverser module for an optical power amplifier of a laser arrangement comprises at least one reflecting surface for receiving an incoming laser beam propagating in a first direction and reflecting the incoming laser beam into a second direction different from the first direction, wherein the at least one reflecting surface is a highly reflecting surface of at least one mirror.

Beam reverser module and optical power amplifier having such a beam reverser module

In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein

Optical element

A mirror with a dielectric coating () on a substrate (), wherein the dielectric coating () has exactly two layer stacks (), a first layer stack (), on the substrate, of layers () of high refractive index and low refractive index oxides in alternating arrangement and a second layer stack (), arranged thereon, of layers of fluorides () and oxides () in alternating arrangement, and wherein the number of fluoride layers () as a proportion of the total number of layers of the dielectric coating () is less than 0.45.

Mirror with dielectric coating

An optical grating has a multiplicity of parallel diffraction structures, which are arranged on a support defining a base face. Each structure has a blaze flank that is inclined substantially at the Littrow angle with respect to the base face, and a back flank. Both flanks together form a reflection layer which comprises a reflective base layer and a transparent protective layer that is connected to the base layer and covers it. The protective layer on the blaze flank and the protective layer on the back flank are made of the same material. The thicknesses of the protective layers on the blaze flank and on the back flank, however, are different.

Optical grating and method for the manufacture of such an optical grating

Optical arrangement, optical grating and method for the manufacture of such an optical grating

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Oberkochen, Germany

Jeffrey Erxmeyer