Lawrence Livermore National Security, LLC

Jeffrey Devin Bude

Eyal Feigenbaum

Gabriel Mark Guss

Manyalibo Joseph Matthews

John J Adams

Raluca A Negres

Michael C Nostrand

Paul J Wegner

Nan Shen

Jeffery A Jarboe

Masoud Bolourchi

Alexander M Rubenchik

Hoang Tan Nguyen

John Edward Heebner

Philip Edward Miller

Michael D Feit

Tayyab Ishaq Suratwala

Gabe Guss

Ted Alfred Laurence

William Augustus Steele

Christopher J Stolz

Thomas M Spinka

Maurice B Aufderheide

Steven T Yang

Jean-Michel Di Nicola

David A Alessi

Lana Louie Wong

Craig W Siders

Scott C Wilks

Sonny S Ly

Andreas J Kemp

Hoang T Nguyen

Daniel C Mason

Wade H Williams

Wesley John Keller

Andrew J Mackinnon

Otto L Landen

Paul Geraghty

Lana L Wong

Richard P Desjardin

Rebecca J Dylla-Spears

Michael Dennis Feit

The present disclosure relates to a waveplate having a substrate forming an optic. The substrate may have an integral portion forming a plurality of angled columnar features on an exposed surface thereof. The plurality of angled columnar features may further be aligned parallel with a directional plane formed non-parallel to a reference plane, with the reference plane being normal to a surface of the substrate. The metasurface forms a birefringent metasurface.

Birefringent waveplate and method for forming a waveplate having a birefringent metasurface

The present disclosure relates to a laser system for processing a material. The system may make use of a laser configured to intermittently generate a first laser pulse of a first duration and a first average power, at a spot on a surface of the material being processed, and a second laser pulse having a second duration and a second peak power. The second duration may be shorter than the first duration by a factor of at least 100, and directed at the spot. The second laser pulse is generated after the first laser pulse is generated. The first laser pulse is used to heat the spot on the surface of the material, while the second laser pulse induces a melt motion and material ejection of molten material from the melt pool.

Laser drilling and machining enhancement using gated CW and short pulsed lasers

A method for increasing the MeV hot electron yield and secondary radiation produced by short-pulse laser-target interactions with an appropriately high or low atomic number (Z) target. Secondary radiation, such as MeV x-rays, gamma-rays, protons, ions, neutrons, positrons and electromagnetic radiation in the microwave to sub-mm region, can be used, e.g., for the flash radiography of dense objects.

Burst-mode chirped pulse amplification method

The present disclosure relates to a detector system for imaging an optical signal received by a graded index (GRIN) optical element to account for known variations in a graded index distribution of the GRIN optical element. The detector system incorporates a plurality of optical detector elements configured to receive optical rays received by the GRIN optical element at specific locations on a plane of the GRIN optical element. Ray tracing software is configured to receive and map the optical rays to a plurality of additional specific locations on the plane based on the known variations in the graded index distribution of the GRIN optical element. A processor uses algorithms for diagonalization of a linear system matrix to determine information on both an intensity and an angle of the received optical rays at each one of the plurality of specific locations on the plane.

System and method for focal-plane illuminator/detector (FASID) design for improved graded index lenses

The present disclosure relates to a method for imaging an optical signal received by a graded index (GRIN) optical element to account for known variations in a graded index distribution of the GRIN optical element. The method may involve using a plurality of optical detector elements to receive optical rays received by the GRIN optical element at a plane, where the plane forms a part of the GRIN optical element or is downstream of the GRIN optical element relative to a direction of propagation of the optical rays. The optical rays are then traced to a plurality of additional specific locations on the plane based on the known variations in the graded index distribution of the GRIN optical element. A processor may be used to determine information on both an intensity and an angle of the received optical rays at each one of the plurality of specific locations on the plane of the GRIN optical element.

System and method for focal-plane angular-spatial illuminator/detector (fasid) design for improved graded index lenses

The present disclosure relates to a system for repairing a damage site on a surface of an optical material. The system may have an Infrared (IR) laser which generates a laser beam having a predetermined wavelength, with a predetermined beam power, and such that the laser beam is focused to a predetermined full width ('F/W') 1/ediameter spot on the damage site. The IR laser may be controlled to maintain the focused IR laser beam on the damage site for a predetermined exposure period corresponding to a predetermined acceptable level of downstream intensification. The laser beam may heat the damage site to a predetermined peak temperature which causes melting and reflowing of material at the damage site to create a mitigated site.

System and method for laser-based, non-evaporative repair of damage sites in the surfaces of fused silica optics

A method for repairing a damage site on a surface of an optical material is disclosed. The method may involve focusing an Infrared (IR) laser beam having a predetermined wavelength, with a predetermined beam power, to a predetermined full width ('F/W') 1/ediameter spot on the damage site. The focused IR laser beam is maintained on the damage site for a predetermined exposure period corresponding to a predetermined acceptable level of downstream intensification. The focused IR laser beam heats the damage site to a predetermined peak temperature, which melts and reflows material at the damage site of the optical material to create a mitigated site.

A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.

Methods for globally treating silica optics to reduce optical damage

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Danville, CA, United States of America

Jeffrey Devin Bude